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2005 Fiscal Year Final Research Report Summary

Electron microscopy analysis by visualization of relationship between composition distribution and charge distribution in quantum well of GaN system

Research Project

Project/Area Number 16560287
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionNational Institute for Materials Science

Principal Investigator

TAKEGUCHI Masaki  National Institute for Materials Science, High-voltage electron microscopy station, Senior Researcher, 超高圧電子顕微鏡ステーション, 主任研究員 (30354327)

Project Period (FY) 2004 – 2005
KeywordsElectron holography / Z-contrast STEM / Transmission electron microscopy / Quantum well structure / Charge density distribution / Interface abruptness
Research Abstract

Piezo electric field of InGaN layer in InGaN/GaN quantum well structure was measured by electron holography. This piezo electric field was caused by lattice strain along c-axis in InGaN layer. We calculated lattice constant from In composition according to Vegards law, and then estimated piezo-polarization. We prepared some samples with various thickness from one wafer. Electron holography was carried out for those samples and internal electric field value evaluated was 0.7±0.2 MV/cm. This value corresponds to the In composition 4.1±1.3% estimated from the theoretical calculation. On the other hand, Z-contrast STEM observation allowed us to evaluate the In composition 4.8±1.6%, which agree to the value obtained by electron holography.
As for AlGaN/GaN quantum well structure, we established the sample preparation technique, e.g., Samples were thinned by wedge-polishing method followed by Ar-ion milling with low voltage, so that the sample thickness was 50-100 nm. This thickness was enough thin to be observed by HRTEM and Z-contrast STEM, and electron holography. From these comprehensive studies, it was found that piezo electric field of AlGaN in AlGaN/GaN quantum well is considerably small rather than InGaN in InGaN/GaN quantum well, suggesting that minimization of damage layer on the sample surfaces and precise thickness measurement are indispensable.

  • Research Products

    (2 results)

All 2004

All Journal Article (2 results)

  • [Journal Article] Determination of In concentration in pseudomorphic InxGal-xN quantum wells based on convergent-beam electron diffraction2004

    • Author(s)
      J.N.Stirman, M.Takeguchi, M.R.McCartney, D.J.Smith
    • Journal Title

      Applied Physics Letters 84

      Pages: 490

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] Mapping On concentration, strain, and internal electric field in InGaN/GaN quantum well structure2004

    • Author(s)
      M.Takeguchi, M.R.McCartney, D.J.Smith
    • Journal Title

      Applied Physics Letters 84

      Pages: 2103

    • Description
      「研究成果報告書概要(和文)」より

URL: 

Published: 2007-12-13  

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