2007 Fiscal Year Final Research Report Summary
| Project/Area Number |
17206073
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| Research Category |
Grant-in-Aid for Scientific Research (A)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Material processing/treatments
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| Research Institution | Kyoto University |
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Principal Investigator |
SUGIMURA Hiroyuki Kyoto University, Graduate School of Engineering, Professor (10293656)
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| Co-Investigator(Kenkyū-buntansha) |
MURASE Kuniaki Kyoto University, Graduate School of Engineering, Associate Professor (30283633)
LEE Kyung-Hwang Kyoto University, Graduate School of Engineering, Assistant Professor (00378796)
ICHII Takashi Kyoto University, Graduate School of Engineering, Assistant Professor (30447908)
TESHIMA Katsuya Shinshu University, Faculty of Engineering, Assistant Professor (00402131)
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| Project Period (FY) |
2005 – 2007
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| Keywords | Microfabrication / Surface modification / Vacuum ultra-violet / Organic materials / Photolithography / Excimer lamp / Photochemistry / Oxygen-amplified photoexposure |
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| Research Abstract |
This research has been conducted in order to develop the microfabrication technology using vacuum ultra-violet (VUV) light at 172 nm in wavelength. A Xe excimer lamp was employed as a light source for photofabrication. Since this VUV light has a high photon energy of 7.2 eV, photochemical reactions can be induced various organic material surfaces. Thus, by simply irradiating a material surface through a photomask, the photomask pattern is directly transferred onto the surface without complicated photolithography processes. Furthermore, we have developed a novel photofabrication process, that is. oxygen-amplified VUV microfabrication, In this process, atmospheric oxygen molecules are excited and dissociated to atomic oxygen. These VUV-generated oxygen atoms oxidize a material surface so the an oxidized pattern is formed on the surface. Atomic oxygen is so oxidative that it can oxidize any types of organic materials. Thus, oxidized patterns can be formed on organic material surfaces which has no photosensitivity to 172 nm VUV light, for example, saturated hydrocarbons. By optimizing VUV patterning conditions, we have succeeded in fabricating 0.5 μm-class fine patterns.
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Research Products
(31 results)
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[Journal Article] Surface Chemical Conversion of Organosilane Self-Assembled Monolayers with Active Oxygen Species Generated by Vacuum Ultraviolet Irradiation of Atmospheric Oxygen Molecules2008
Author(s)
Young-Jong, Kim, Kyung-Hwang, Lee, Hikaru, Sano, Jiwon, Han, Takashi, Ichii, Kuniaki, Murase, Hiroyuki, Sugimura
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Journal Title
Jpn. J. Appl. Phys Vol. 47, No.1
Pages: 307-312
Description
「研究成果報告書概要(欧文)」より
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[Journal Article] Patterning of Self-assembled Thin Films Using Vacuum Ultraviolet Irradiation Through Anodic Porous Alumina Mask2007
Author(s)
Masahiro, Harada, Sunao, Murata, Takashi, Yanagishita, Hiroyuki, Sugimura, Kazuyuki, Nishio, Hideki, Masuda
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Journal Title
Chem. Lett Vol. 36, No.10
Pages: 1266-1267
Description
「研究成果報告書概要(欧文)」より
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[Journal Article] Self-Assembled Monolayers on Si2006
Author(s)
Hiroyuki, Sugimura
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Journal Title
Nanocrystalline Materials : Their Synthesis-Structure-Property Relationships and Applications (Edited by S.C. Tjong, Elesevier, Oxford)
Pages: 75-91
Description
「研究成果報告書概要(欧文)」より
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