2006 Fiscal Year Final Research Report Summary
Self-assembly Patterning of Colloidal Crystals by Two-solution Method
| Project/Area Number |
17560595
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Inorganic materials/Physical properties
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| Research Institution | National Institute of Advanced Industrial Science and Technology (AIST) (2006)
Nagoya University (2005) |
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Principal Investigator |
MASUDA Yoshitake National Institute of Advanced Industrial Science and Technology (AIST), 先進技術プロセス研究部門, 研究員 (20324460)
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| Project Period (FY) |
2005 – 2006
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| Keywords | Particle assembly / Patterning / Colloidal crystal / photonic crystal / self-assembly |
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| Research Abstract |
We developed a self-assembly process of silica particles to fabricate desired patterns of colloidal crystals having high feature edge acuity and high regularity. A micropattern of colloidal methanol prepared on a self-assembled monolayer in hexane was used as a mold for particle patterning, and slow dissolution of methanol into hexane caused shrinkage of molds to form micropatterns of close-packed SiCte particle assemblies. This result is a step toward the realization of nano/micro periodic structures for next-generation photonic devices by a self-assembly process.
We further proposed a novel process to fabricate micropatterns of spherical particle assemblies. Hydrophilic regions of a patterned self-assembled monolayer were covered with methanol solution containing SiO_2 particles and immersed in decalin to control the shape of droplets and gradually dissolve the methanol into decalin. Interfacing of methanol/decalin and shrinkage of methanol droplets were utilized to obtain meniscus force to form spherical particle assemblies; additionally, its static solution system allowed precise control of the conditions. Particles were assembled to form spherical shapes on hydrophilic regions of an SAM and consequently, micropatterns of spherical particle assemblies were successfully fabricated through self-assembly. This patterned two-solution process has the advantages of both a drying process having meniscus force and a static solution process having high controllability.
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Research Products
(75 results)
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[Journal Article] Patterning of Particles2006
Author(s)
Yoshitake Masuda
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Journal Title
Development and Processing Technology of New Function Corpuscle Materials(CMC Publishing CO., LTD.)
Pages: 198-209
Description
「研究成果報告書概要(欧文)」より
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