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2010 Fiscal Year Final Research Report

Investigation on development of advanced frequency shift probe

Research Project

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Project/Area Number 20540487
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Plasma science
Research InstitutionChubu University

Principal Investigator

NAKAMURA Keiji  Chubu University, 工学部, 教授 (20227888)

Co-Investigator(Kenkyū-buntansha) SUGAI Hideo  中部大学, 工学部, 教授 (40005517)
Project Period (FY) 2008 – 2010
Keywords周波数シフトプローブ / マイクロ波共振器プローブ / 電子密度 / 電子温度 / シース
Research Abstract

This paper reports plane-type frequency shift probe for electron density measurements in reactive processing plasmas. The sheath effects were investigated by electromagnetic field analysis with FDTD simulation, and the calculated characteristics were confirmed experimentally. The FDTD simulation revealed that the sheath formed around the probe leads to underestimation of electron density, in comparison to the real density given as an initial condition in the simulation. However, an increase in a slit width of the probe antenna suppressed the density underestimation, and effective for improvement of accuracy of the density measurement. Furthermore, combination of two probes with different slit width enabled measurements of not only electron density and electron temperature by considering the sheath effects.

  • Research Products

    (17 results)

All 2011 2010 2009 2008

All Journal Article (6 results) (of which Peer Reviewed: 6 results) Presentation (11 results)

  • [Journal Article] Observation of Optical Fluorescence of GaN Thin Films in an Inductively-Coupled Plasma Containing High Energy Electrons2010

    • Author(s)
      Y.Guo, K.Nakamura, J.Zhang, Y.Nakano, H.Sugai
    • Journal Title

      Jpn.J.Appl.Phys. 50

      Pages: 01AA02_1

    • Peer Reviewed
  • [Journal Article] Advanced high-pressure plasma diagnostics with hairpin resonator probe surrounded by film and sheath2010

    • Author(s)
      J.Xu, J.Shi, J.Zhang, Q.Zhang, K.Nakamura, H.Sugai
    • Journal Title

      Chinese Physics B 29

      Pages: 075206-1-075206-7

    • Peer Reviewed
  • [Journal Article] 反応性プロセシングプラズマにおける電子密度測定用平板型マイクロ波共振器プローブとシース効果2010

    • Author(s)
      中村圭二,張祺,菅井秀郎
    • Journal Title

      電気学会論文誌A 130

      Pages: 930-934

    • Peer Reviewed
  • [Journal Article] Simulation of Resistive Microwave Resonant Probe for High Pressure Plasma Diagnostics2009

    • Author(s)
      J.Xu, K.Nakamura, Q.Zhang, H.Sugai
    • Journal Title

      Plasma Sources Science and Technology 28

      Pages: 045009-045018

    • Peer Reviewed
  • [Journal Article] Extension of Frequency Shift Probes for Monitoring of Electron Temperature2008

    • Author(s)
      K.Nakamura, Q.Zhang, H.Sugai
    • Journal Title

      Proc.30th international symposium on dry process

      Pages: 181-182

    • Peer Reviewed
  • [Journal Article] Application of Droplet-Free Metal Ion Source to Formation of Gas Barrier Thin Films2008

    • Author(s)
      K. Nakamura
    • Journal Title

      Physica Status Solidi c 5

      Pages: 887-892

    • Peer Reviewed
  • [Presentation] Electron Density Measurement by Novel Frequency Shift Probe2011

    • Author(s)
      I.Liang, K.Kato, K.Nakamura, H.Sugai
    • Organizer
      3rd Int.Symp.Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      2011-03-07
  • [Presentation] Miniaturization of Plane-Type Microwave Resonator Probe2011

    • Author(s)
      E.Kumazaki, K.Nakamura, H.Sugai
    • Organizer
      3rd Int.Symp.Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      2011-03-07
  • [Presentation] Plasma Electron Monitoring with Multi-Resonator Frequency Shift Probe2010

    • Author(s)
      Q.Zhang, K.Nakamura, H.Sugai
    • Organizer
      2nd International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      20100307-20100310
  • [Presentation] Investigation on Frequency Shift Probes for Monitoring of Electron Conditions in Nano-Materials Processing Plasmas2010

    • Author(s)
      K.Nakamura
    • Organizer
      Int.Symp.Visualization in Joining & Welding Science through Advanced Measurements and Simulation, and Advanced Materials Development and Integration of Novel Structured Metallic and Inorganic Materials in conjunction with Symposium on the research Activities of Joint Usage/Research Center on Joining and Welding (Visual-JW2010)
    • Place of Presentation
      Osaka, Japan(招待講演)
    • Year and Date
      2010-11-12
  • [Presentation] Influence of Sheath on Measurement of Electron Density in Frequency Shift Probe and its Application to Measurement of Electron Temperature2009

    • Author(s)
      K.Nakamura, Q.Zhang, H.Sugai
    • Organizer
      American Vaccuum Society 56th Int.Symp.and Exhibition (AVS-56)
    • Place of Presentation
      San Jose, U.S.A.
    • Year and Date
      20091108-20091113
  • [Presentation] Sheath Effects on Electron Density Measurements in Frequency Shift Probe and their Application to Electron Temperature Measurements2009

    • Author(s)
      K.Nakamura, Q.Zhang, H.Sugai
    • Organizer
      62nd Gaseous Electronics Conference (GEC2009)
    • Place of Presentation
      Saratoga, U.S.A.
    • Year and Date
      20091022-20091025
  • [Presentation] Influence of Polymer Depositon on Electron Monitoring with Frequency Shift Probes2009

    • Author(s)
      Q.Zhang, K.Nakamura, H.Sugai
    • Organizer
      1st Int.Symp.Advanced Plasma Science & its Applications (ISPlasma2009)
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      2009-03-08
  • [Presentation] Development of Electron-Based Plasma Monitoring for Precise Control of Plasma Process2009

    • Author(s)
      K.Nakamura, H.Sugai
    • Organizer
      1st Int.Symp.Advanced Plasma Science & its Applications (ISPlasma 2009)
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      2009-03-08
  • [Presentation] Monitoring of Electron Density with Frequency Shift Probes in Reactive Processing Plasmas2009

    • Author(s)
      K.Nakamura, Q.Zhang, H.Sugai
    • Organizer
      2nd Int.Conf.Plasma-Nano Technol.& Sci.(IC-PLANTS2009)
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      2009-01-22
  • [Presentation] Development of Frequency Shift Probes for Monitoring of Electron Density in Reactive Nano-Materials Processing Plasmas2008

    • Author(s)
      K.Nakamura, Q.Zhang, H.Sugai
    • Organizer
      IUMRS International Conference in Asia 2008 (IUMRS-ICA 2008)
    • Place of Presentation
      Nagoya, Japan(招待講演)
    • Year and Date
      2008-12-09
  • [Presentation] Effects of probe shape on electron density measurements with frequency shift2008

    • Author(s)
      K.Nakamura, Q.Zhang, H.Sugai
    • Organizer
      14th International Congress on Plasma Physics
    • Place of Presentation
      Fukuoka, Japan
    • Year and Date
      2008-09-11

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Published: 2012-01-26   Modified: 2016-04-21  

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