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2012 Fiscal Year Final Research Report

Demonstration of innovative Germanium optoelectronic devices and developments of simulation technologies

Research Project

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Project/Area Number 21246003
Research Category

Grant-in-Aid for Scientific Research (A)

Allocation TypeSingle-year Grants
Section一般
Research Field Applied materials science/Crystal engineering
Research InstitutionTokyo City University

Principal Investigator

SHIRAKI Yasuhiro  東京都市大学, 総合研究所, 教授 (00206286)

Co-Investigator(Kenkyū-buntansha) MARUIZUMI Takuya  東京都市大学, 工学部, 教授 (00398893)
NOHIRA Hiroshi  東京都市大学, 工学部, 教授 (30241110)
SAWANO Kentarou  東京都市大学, 工学部, 准教授 (90409376)
SETO Kenshu  東京都市大学, 工学部, 講師 (10420241)
XU Xuejun  東京都市大学, 総合研究所, 研究員 (80593334)
XIA Jinsong  東京都市大学, 総合研究所, 助手 (00434184)
Co-Investigator(Renkei-kenkyūsha) NAKAGAWA Kitokazu  山梨大学, 医学工学総合研究部, 教授 (40324181)
MATSUI Toshiaki  独立行政法人情報通信研究機構, 専攻研究員 (20358922)
MIYATA Noriyuki  独立行政法人産業技術総合研究所, エレクトロニクス研究部門, 主任研究員 (40358130)
USAMI Noritaka  東北大学, 金属材料研究所, 准教授 (20262107)
Project Period (FY) 2009 – 2012
Keywordsゲルマニウム / 量子ドット / フォトニック結晶 / シミュレーション / 歪み / 微小共振器 / 導波路
Research Abstract

We established essential technologies for realization of Ge optoelectronic devices on the Si platform, which are promising innovative devices with high performances and low power consumption toward next-generation LSI (Large Scale Integration), along with simulation technologies. We succeeded in formation of novel strained Ge channel structures and strained Ge-on-Insulator, room-temperature strong electroluminescence from photonic crystal and microdisk maicrocavities with Ge quantum dots and their coupling with optical waveguide.

  • Research Products

    (29 results)

All 2012 2011 2010 2009 Other

All Journal Article (14 results) (of which Peer Reviewed: 14 results) Presentation (12 results) Book (2 results) Remarks (1 results)

  • [Journal Article] Formation of Tensilely Strained Germanium- on- Insulator2012

    • Author(s)
      Yusuke Hoshi, Kentarou Sawano, Kohei Hamaya
    • Journal Title

      Masanobu Miyao, and Yasuhiro Shiraki Applied Physics Express

      Volume: 5 Pages: 015701

    • DOI

      DOI:10.1143/APEX.5.015701

    • Peer Reviewed
  • [Journal Article] Upper limit of two-dimensional hole gas mobility in strained Ge/SiGe Heterostructures2012

    • Author(s)
      T. Tanaka, Y. Hoshi, K. Sawano, N. Usami, Y. Shiraki, and K. M. Itoh
    • Journal Title

      Appl. Phys. Lett.

      Volume: 100 Pages: 222102

    • DOI

      DOI:10.1063/1.4723690

    • Peer Reviewed
  • [Journal Article] Acceptor-Like States in SiGe Alloy Related to Point Defects Induced by Si+ Ion Implantation2012

    • Author(s)
      Motoki Satoh, Keisuke Arimoto, Junji Yamanaka, Kiyokazu Nakagawa, Kentarou Sawano, and Yasuhiro Shiraki
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 51 Pages: 105801

    • DOI

      DOI:10.1143/JJAP.51.105801

    • Peer Reviewed
  • [Journal Article] Silicon-based current-injected light emitting diodes with Ge self-assembled quantum dots embedded in photonic crystal nanocavities2012

    • Author(s)
      Xuejun Xu, Toshiki Tsuboi, Taichi Chiba, Noritaka Usami, Takuya Maruizumi, and Yasuhiro Shiraki
    • Journal Title

      Optics Express

      Volume: 20(13) Pages: 14714-14721

    • DOI

      DOI:10.1364/OE.20.014714

    • Peer Reviewed
  • [Journal Article] Silicon-based light emitting devices based on Ge self-assembled quantum dots embedded in optical cavity2012

    • Author(s)
      Xuejun Xu, Sho Narusawa, Taichi Chiba, Toshiki Tsuboi, Jinsong Xia, Noritaka Usami, Takuya Maruizumi, and Yasuhiro Shiraki
    • Journal Title

      IEEE Journal of Selected Topics inQuantum Electronics

      Volume: 18(6) Pages: 1830-1838

    • DOI

      DOI:10.1109/JSTQE.2012.2206802

    • Peer Reviewed
  • [Journal Article] Room temperature electroluminescence from Ge quantum dots embedded in photonic crystal microcavities2012

    • Author(s)
      Toshiki Tsuboi, Xuejun Xu, Jinsong Xia,Noritaka Usami, Takuya Maruizumi, andYasuhiro Shiraki
    • Journal Title

      Applied Physics Express

      Volume: 5 Pages: 052101-1 -052101-3

    • DOI

      DOI:10.1143/APEX.5.052101

    • Peer Reviewed
  • [Journal Article] High-quality-factor light-emitting diodes with modified photonic crystal nanocavities including Ge self-assembled quantum dots on silicon-on-insulator substrates2012

    • Author(s)
      Xuejun Xu, Taichi Chiba, Tatsuya Nakama, Takuya Maruizumi, and Yasuhiro Shiraki
    • Journal Title

      Applied Physics Express

      Volume: 5 Pages: 102101-1 -102101-3

    • DOI

      DOI:10.1143/APEX.5.102101

    • Peer Reviewed
  • [Journal Article] Line width dependence of anisotropic strain state in SiGe films induced by selective ion implantation2011

    • Author(s)
      Y. Hoshi, K. Sawano, A. Yamada, S. Nagakura, N. Usami, K. Arimoto, K. Nakagawa, and Y. Shiraki
    • Journal Title

      Applied Physics Express

      Volume: 4 Pages: 095701

    • Peer Reviewed
  • [Journal Article] Formation of Uniaxially Strained SiGe by Selective Ion Implantation Technique2010

    • Author(s)
      Kentarou Sawano, Yusuke Hoshi, AtsunoriYamada, Yoshiyasu Hiraoka, Noritaka Usami, Keisuke Arimoto, Kiyokazu Nakagawa, and Yasuhiro Shiraki
    • Journal Title

      Thin Solid Films

      Volume: 518 Pages: 2454

    • Peer Reviewed
  • [Journal Article] Ultrashallow Ohmic contacts for n-type Ge by Sb --doping2010

    • Author(s)
      K. Sawano, Y. Hoshi, K. Kasahara, K. Yamane, K. Hamaya, M. Miyao, and Y. Shiraki
    • Journal Title

      Appl. Phys. Lett.

      Volume: 97 Pages: 162108

    • Peer Reviewed
  • [Journal Article] Room-temperature electroluminescence from Si microdisks with Ge quantum dots2010

    • Author(s)
      J. Xia, Y. Takeda, N. Usami, T. Maruizumi, and Y. Shiraki
    • Journal Title

      Optics Express

      Volume: 18 Pages: 13945-13950

    • Peer Reviewed
  • [Journal Article] Ion dose, energy, and species dependencies of strain relaxation of SiGe buffer layers fabricated by ion implantation technique2010

    • Author(s)
      Y. Hoshi, K. Sawano, A. Yamada, N. Usami,K. Arimoto, K. Nakagawa, and Y. Shiraki
    • Journal Title

      J. Appl. Phys.

      Volume: 107 Pages: 103509

    • Peer Reviewed
  • [Journal Article] Local Control of Strain in SiGe by IonImplantation Technique2009

    • Author(s)
      K. Sawano, Y. Hoshi, Y. Hiraoka, N. Usami , K. Nakagawa, Y. Shiraki
    • Journal Title

      Journal of Crystal Growth

      Volume: 311 Pages: 806-808

    • Peer Reviewed
  • [Journal Article] Strain dependence of hole effective mass and scattering mechanism in strained Ge channel structures2009

    • Author(s)
      K. Sawano, K. Toyama, R. Masutomi, T. Okamoto, N. Usami, K. Arimoto, K. Nakagawa, and Y. Shiraki
    • Journal Title

      Appl. Phys. Lett.

      Volume: 95 Pages: 122109

    • Peer Reviewed
  • [Presentation] Room-temperature photonic crystal nanocavity light emitting diodes based on Ge self-assembled quantum dots2012

    • Author(s)
      Xuejun Xu
    • Organizer
      2012 IEEE International Electron Devices Meeting (IEDM)
    • Place of Presentation
      San Francisco, USA
    • Year and Date
      20121210-12
  • [Presentation] Electroluminescence from micro- cavities of photonic crystals, micro- disks and rings including Ge dots formed on SOI substrates2012

    • Author(s)
      Yasuhiro Shiraki
    • Organizer
      Invited221st ECS Meeting
    • Place of Presentation
      Seattle, Washington, USA
    • Year and Date
      20120506-10
  • [Presentation] On the origin of the uniaxial strain induced in Si/Ge heterostructures with selective ion implantation technique2012

    • Author(s)
      K. Sawano
    • Organizer
      The 17th International Conference on Molecular Beam Epitaxy
    • Place of Presentation
      Nara, Japan
    • Year and Date
      2012-09-26
  • [Presentation] Ion Implantation for Strain Engineering of Si-based Semiconductor2011

    • Author(s)
      Kentarou Sawano
    • Organizer
      Invited BIT's 1st Annual World Congress ofNano-S&T 2011
    • Place of Presentation
      Dalian, China
    • Year and Date
      2011-10-26
  • [Presentation] XPS Study on Chemical Bonding States of high-kappa/high-k Gate Stacks for Advanced CMOS2011

    • Author(s)
      Hiroshi Nohira
    • Organizer
      Invited220th Meeting of The ElectrochemicalSociety
    • Place of Presentation
      Boston, USA
    • Year and Date
      2011-10-11
  • [Presentation] Surface segregation behavior of Sb, B, Ga, and As dopant atoms on Ge(100) and Ge(111) surface examined with afirst-principles method2011

    • Author(s)
      T. Maruizumi
    • Organizer
      7th International Conference on Si Epitaxy and Heterostructures
    • Place of Presentation
      Leuven, Belgium
    • Year and Date
      2011-08-30
  • [Presentation] Surface segregation behavior of Sb, B, and As dopant atoms on Ge(111) surface2011

    • Author(s)
      T. Maruizumi
    • Organizer
      E-MRS 2011 Spring & Bilateral Meeting
    • Place of Presentation
      Nice, France
    • Year and Date
      2011-05-10
  • [Presentation] Stable position of B12 Cluster NearSi(001) Surface and Its STM images2010

    • Author(s)
      T. Maruizumi
    • Organizer
      218th Meeting of The ElectrochemicalSociety
    • Place of Presentation
      Las Vegas, USA
    • Year and Date
      2010-10-12
  • [Presentation] Si-Based Light Emitting Devices Based onGe Self-Assembled Quantum Dots2009

    • Author(s)
      J. Xia
    • Organizer
      Invited2009 International Symposium on Crystal Science and Technologies
    • Place of Presentation
      Kofu, Yamanashi
    • Year and Date
      2009-12-04
  • [Presentation] Material aspects and characterization of Si/Ge hetero-structures on nano-scale for electronic and optical deviceapplications2009

    • Author(s)
      Y. Shiraki
    • Organizer
      Invited1st International Workshop on Si based nano-electronics and -photonics (SiNEP-09)
    • Place of Presentation
      Vigo, Spain
    • Year and Date
      2009-09-22
  • [Presentation] Current-injected Si microdisk with Ge self-assembled quantum dots2009

    • Author(s)
      J. Xia
    • Organizer
      Invited2nd Photonics and OptoElectronics Meetings (POEM 2009)
    • Place of Presentation
      Wuhan, China
    • Year and Date
      2009-08-10
  • [Presentation] CMP for high mobility strained Si/GeChannels2009

    • Author(s)
      Kentarou Sawano
    • Organizer
      Invited2009 MRS (Materials Research Society) Spring Meeting, Symposium E : Science andTechnology of Chemical Mechanical Planarization (CMP)
    • Place of Presentation
      San Francisco, USA
    • Year and Date
      2009-04-16
  • [Book] Silicon germanium (SiGe)nanostructures2011

    • Author(s)
      Y. Shiraki and N. Usami
    • Total Pages
      627
    • Publisher
      Woodhead Publishing
  • [Book] 量子ドット‐エレクトロ ニクス最前線2011

    • Author(s)
      丸泉琢也、夏金松
    • Total Pages
      275-284
    • Publisher
      エヌティーエス社
  • [Remarks]

    • URL

      http://www.arl.tcu.ac.jp/sns.html

URL: 

Published: 2014-08-29  

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