2010 Fiscal Year Final Research Report
Selective formation of germanium-on-insulator structures based on liquid phase epitaxy by laser annealing
Project/Area Number |
21760009
|
Research Category |
Grant-in-Aid for Young Scientists (B)
|
Allocation Type | Single-year Grants |
Research Field |
Applied materials science/Crystal engineering
|
Research Institution | Osaka University |
Principal Investigator |
HOSOI Takuji Osaka University, 工学研究科, 助教 (90452466)
|
Project Period (FY) |
2009 – 2010
|
Keywords | ゲルマニウム / GOI基板 / SGOI基板 / 液相エピタキシャル成長 |
Research Abstract |
GOI (Ge-On-Insulator) and SGOI(SiGe-On-Insulator) structures are promising candidates for next-generation semiconductor substrate. We proposed and demonstrated the selective fabrication of single-crystalline Ge wires and high-quality fully relaxed SiGe layers on insulators by liquid-phase epitaxy.
|
Research Products
(7 results)