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2012 Fiscal Year Final Research Report

Suppression of dendrite growth in electrochemical reactions based on modeling of growing interfaces

Research Project

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Project/Area Number 23750239
Research Category

Grant-in-Aid for Young Scientists (B)

Allocation TypeMulti-year Fund
Research Field Inorganic industrial materials
Research InstitutionKyoto University

Principal Investigator

FUKAMI Kazuhiro  京都大学, エネルギー理工学研究所, 助教 (60452322)

Project Period (FY) 2011 – 2012
Keywords電気化学
Research Abstract

Suppression of dendrite growth in rechargeable batteries was studied. We have found that hydrophobic porous electrodes such as porous silicon lead to an extreme enhancement of electrodeposition within the porous structures. With an aid of the statistical-mechanical theory, it has been revealed that the surface concentration of metal ions was greatly enriched when the surface shows hydrophobic property. The growth of dendrites in electrodeposition was strongly suppressed when using porous silicon as a host matrix. This result originates from a high current efficiency even when applying a current density much higher than the limiting current.

  • Research Products

    (18 results)

All 2013 2012 2011

All Journal Article (4 results) (of which Peer Reviewed: 4 results) Presentation (14 results)

  • [Journal Article] Electrochemical deposition of platinum within nanopores on silicon: Drastic acceleration originating from surfaceinduced phase transition2013

    • Author(s)
      Kazuhiro Fukami, Ryo Koda, Tetsuo Sakka, Yukio Ogata, Masahiro Kinoshita
    • Journal Title

      The Journal of Chemical Physics

      Volume: 138 Pages: 094702/1-10

    • DOI

      DOI:10.1063/1.4793526

    • Peer Reviewed
  • [Journal Article] A physical mechanism for suppression of zinc dendrites caused by high efficiency of the electrodeposition within confined nanopores2013

    • Author(s)
      Ryo Koda, Kazuhiro Fukami, Tetsuo Sakka, Yukio H. Ogata
    • Journal Title

      ECS Electrochemistry Letters

      Volume: 2 Pages: D9-D11

    • DOI

      DOI:10.1149/2.010302eel

    • Peer Reviewed
  • [Journal Article] Electrodeposition of platinum and silver into chemically-modified microporous silicon electrodes2012

    • Author(s)
      Ryo Koda, Kazuhiro Fukami, Tetsuo Sakka, Yukio H. Ogata
    • Journal Title

      Nanoscale Research Letters

      Volume: 7 Pages: 330/1-5

    • DOI

      DOI:10.1186/1556-276X-7-330

    • Peer Reviewed
  • [Journal Article] Platinum electrodeposition in porous silicon: The influence of surface solvation effects on a chemical reaction in a nanospace2012

    • Author(s)
      Kazuhiro Fukami, Ryo Koda, Tetsuo Sakka, Tomoko Urata, Ken-ichi Amano, Hikaru Takaya, Masaharu Nakamura, Yukio Ogata, Masahiro Kinoshita
    • Journal Title

      Chemical Physics Letters

      Volume: 542 Pages: 99-105

    • DOI

      DOI:10.1016/j.cplett.2012.05.078

    • Peer Reviewed
  • [Presentation] ミクロ多孔質電極を用いた亜鉛電析におけるデンドライト抑制2013

    • Author(s)
      幸田吏央, 深見一弘, 作花哲夫, 尾形幸生
    • Organizer
      電気化学会第80回大会
    • Place of Presentation
      東北大学, 仙台市
    • Year and Date
      2013-03-31
  • [Presentation] 多孔質シリコン電極への白金析出における表面誘起水和構造の影響2013

    • Author(s)
      深見一弘, 幸田吏央, 作花哲夫, 尾形幸生, 木下正弘
    • Organizer
      電気化学会第80回大会
    • Place of Presentation
      東北大学, 仙台市
    • Year and Date
      2013-03-29
  • [Presentation] 多孔質シリコンでの白金置換析出に現れる孔径に依存した異常挙動2013

    • Author(s)
      小山輝 幸田吏央, 深見一弘, 作花哲夫, 尾形幸生
    • Organizer
      表面技術協会第127回講演大会
    • Place of Presentation
      日本工業大学,埼玉県
    • Year and Date
      2013-03-19
  • [Presentation] ミクロ多孔質電極を用いた亜鉛デンドライトの抑制2012

    • Author(s)
      幸田吏央, 深見一弘, 作花哲夫, 尾形幸生
    • Organizer
      2012年度 第3回 関西電気化学研究会
    • Place of Presentation
      2012年度 第3回 関西電気化学研究会
    • Year and Date
      2012-12-01
  • [Presentation] ミクロ多孔質シリコンへの白金電解析出に伴う置換析出の寄与2012

    • Author(s)
      小山輝, 幸田吏央, 深見一弘, 作花哲夫, 尾形幸生
    • Organizer
      第14回関西表面技術フォーラム
    • Place of Presentation
      京都大学宇治おうばくプラザ,宇治市
    • Year and Date
      2012-11-29
  • [Presentation] ミクロ多孔質シリコンへの白金置換析出における孔深さの影響2012

    • Author(s)
      小山輝, 幸田吏央, 深見一弘, 作花哲夫, 尾形幸生
    • Organizer
      第29回ARS伊豆長岡コンファレンス
    • Place of Presentation
      公共の宿 おおとり荘, 伊豆の国市
    • Year and Date
      2012-11-01
  • [Presentation] ナノポーラス電極を用いた亜鉛電析におけるデンドライト抑制の物理モデル2012

    • Author(s)
      幸田吏央, 深見一弘, 作花哲夫, 尾形幸生
    • Organizer
      第29回ARS伊豆長岡コンファレンス
    • Place of Presentation
      公共の宿 おおとり荘, 伊豆の国市
    • Year and Date
      2012-11-01
  • [Presentation] アノード分極下におけるミクロ多孔質シリコン内への貴金属析出2012

    • Author(s)
      幸田吏央, 小山輝, 深見一弘, 作花哲夫, 尾形幸生
    • Organizer
      表面技術協会第126回講演大会
    • Place of Presentation
      室蘭工業大学,室蘭
    • Year and Date
      2012-09-27
  • [Presentation] Noble metal deposition into microposous silicon under anodic polarization2012

    • Author(s)
      R. Koda, A. Koyama, K. Fukami, T. Sakka, Y. H. Ogata
    • Organizer
      6th Kyoto International Forum for Energy and Environment
    • Place of Presentation
      ノルウェー科学技術大学, トロンハイム, ノルウェー
    • Year and Date
      2012-09-11
  • [Presentation] Electrodeposition of noble metals into chemically modified microporous silicon substrates2012

    • Author(s)
      R. Koda, K. Fukami, T. Sakka, Y.H. Ogata
    • Organizer
      第8回多孔質半導体国際会議(PSST-2012)
    • Place of Presentation
      マラガ, スペイン
    • Year and Date
      2012-03-27
  • [Presentation] ミクロ多孔質シリコンの孔内における金属析出制御2011

    • Author(s)
      幸田吏央, 深見一弘, 作花哲夫, 尾形幸生
    • Organizer
      第28回ARS神戸コンファレンス
    • Place of Presentation
      神戸市
    • Year and Date
      2011-11-10
  • [Presentation] Electrodeposition of platinum into chemically-modified microporous silicon substrates2011

    • Author(s)
      R. Koda,T. Urata, K. Fukami, T. Sakka, Y. H. Ogata
    • Organizer
      The 62nd Annual Meeting of the International Society of Electrochemistry
    • Place of Presentation
      朱鷺メッセ, 新潟市
    • Year and Date
      2011-09-12
  • [Presentation] 化学修飾された多孔質シリコンへの金属めっきに孔径が及ぼす影響2011

    • Author(s)
      幸田吏央,浦田智子,深見一弘,作花哲夫,尾形幸生
    • Organizer
      電気化学会第79回大会
    • Place of Presentation
      朱鷺メッセ, 新潟市
    • Year and Date
      2011-09-10
  • [Presentation] Electrodeposition of platinum within porous silicon: the effect of displacement deposition2011

    • Author(s)
      K. Fukami, R. Koda, T. Urata, D. Shiojima, T. Sakka, Y.H. Ogata
    • Organizer
      9thEco-Energy and Materials Science and Engineering Symposium
    • Place of Presentation
      Chiang Rai, Thailand.
    • Year and Date
      2011-05-27

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Published: 2014-09-25  

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