Experimental investigations on the flow instability due to buoyancy and its application to film-deposition by CVD

2014 Fiscal Year Final Research Report

• Project/Area Number: 24560228
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Thermal engineering
• Research Institution: Toyohashi University of Technology
• Principal Investigator: KITAMURA Kenzo 豊橋技術科学大学, 工学(系)研究科(研究院), 教授 (20126931)
• Project Period (FY): 2012-04-01 – 2015-03-31
• Keywords: 対流 / 伝熱 / 共存対流

Outline of Final Research Achievements

It is known that the unstable flow due to buoyancy causes a non-uniform film-deposition over heated silicon substrate in a barrel or pedestal CVD reactor. In the present study, the flow instability due to buoyancy was exploited experimentally through the flow visualizations. Heat transfer measurements were also carried out to investigate the influence of the flow instability on the local heat transfer from the plate. The experiments were conducted with the upward-facing, heated wedges placed in a uniform vertical downward flow of air, which simulates the aforementioned reactors. The wedge-angle was varied systematically from vertical to horizontal. The results showed that the flow is most stable when the wedge-angles from 135 to 110°, besides that the heat transfer coefficients from the wedge become uniform at the identical angles.

Free Research Field

熱工学