Optical interconnecting technologies and devices applying Mask-transfer Self-written method with light curable resin

2014 Fiscal Year Final Research Report

• Project/Area Number: 24560417
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Electron device/Electronic equipment
• Research Institution: Tokai University
• Principal Investigator: MIKAMI Osamu 東海大学, 工学部, 教授 (30266366)
• Project Period (FY): 2012-04-01 – 2015-03-31
• Keywords: 光配線 / 自己形成光導波路 / 光硬化樹脂 / 光ピン / V溝 / 光路変換 / 光接続 / 光インターコネクション

Outline of Final Research Achievements

To develop practical optical interconnects, sophisticated packaging and coupling technologies are needed that can achieve both high coupling efficiency and easy alignment.　Innovative optical interconnecting technologies have been established by applying self-written waveguide (SWW) fabrication method with UV-curable resin.　We devised a new technology called the mask-transfer SWW method. This method involves contact exposure of UV-curable resin through a photomask. A unique aspect of this method is that SWWs having two-dimensional array patterns can be fabricated by a single shot of UV irradiation.
We have succeeded in establishment of technologies of fabricating smart polymer optical pins, polymer V-grooves, and a polymer micro prism in which 4-channel waveguides having 90-dgree light path conversion are built-in.
With these remarkable research achievements, we can expect optical interconnection technology will spread further by drastic solution of conventional problems.

Free Research Field

光インターコネクション