2014 Fiscal Year Final Research Report
Process control of magnetic materials for thin film actuator
| Project/Area Number |
24560859
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Multi-year Fund |
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| Section | 一般 |
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| Research Field |
Structural/Functional materials
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| Research Institution | Tokai University |
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Principal Investigator |
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| Project Period (FY) |
2012-04-01 – 2015-03-31
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| Keywords | アクチュエータ材料 / 薄膜 / プラズマ / 過剰エネルギー / イオン衝撃 / 内部応力 / スパッタリング / イオンプレーティング |
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| Outline of Final Research Achievements |
1. Development of new materials for thin film actuator; In this study, Fe-IIIB supersaturated thin film for new magnetrostrictive materials were prepared by ion plating process with dual vapor source. Then discuss the effects of excess energy on thin films nanostructure and solid solubility limit of various solid solution. Excess energy increased with the increase of impinging energy of evaporated particles by rising applied bias voltage and substrate bias voltage. Therefore, excess energy control of ion plating process could be helpful to control solid solubility limit of solid solution.
2. Property Control of thin film actuators; Momentum of ion bombardment in sputtering deposition process, which strongly depends on internal stress of thin films, has been evaluated regarding to a new parameter Pi.. The internal stress of Ni Film changed linearly with the ion bombardment parameter Pi. These results suggest to be useful to control the internal stress of sputtered thin film with the Pi.
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| Free Research Field |
薄膜工学 材料科学 スマート材料
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