Development of anisotropy-control-technique of amorphous carbon by plasma CVD under atmospheric pressure

2017 Fiscal Year Final Research Report

• Project/Area Number: 26790065
• Research Category: Grant-in-Aid for Young Scientists (B)
• Allocation Type: Multi-year Fund
• Research Field: Plasma electronics
• Research Institution: Kushiro National College of Technology
• Principal Investigator: Saito Seiki 釧路工業高等専門学校, 創造工学科, 准教授 (40725024)
• Research Collaborator: TAKAMURA Shuichi ; OHNO Noriyasu ; YAMADA Hideaki ; NAKAMURA Hiroaki ; TAMURA Yuichi
• Project Period (FY): 2014-04-01 – 2018-03-31
• Keywords: アモルファス炭素 / 大気圧 / マイクロ波 / プラズマ

Outline of Final Research Achievements

Plasma jet was successfully generated in atmospheric pressure by microwave excitation. A chamber was also installed surrounding the jet plasma to cut off the oxygen in surrounding atmosphere by filling nitrogen gas in the chamber. Oxidized carbon deposits are obtained by methane plasma irradiation in the air. However, carbon deposits which does not bond to oxygen atom are observed when methane plasma is irradiated in a chamber with no oxygen. In addition, it was confirmed that fibrous nanostructures were generated on the tungsten surface as a result of helium plasma irradiation to tungsten substrate by the same device.

Free Research Field

プラズマ材料科学