| Co-Investigator(Kenkyū-buntansha) |
大門 寛 奈良先端科学技術大学院大学, 先端科学技術研究科, 教授 (20126121)
下村 勝 静岡大学, 創造科学技術大学院, 教授 (20292279)
室 隆桂之 公益財団法人高輝度光科学研究センター, 利用研究促進部門, 主幹研究員 (50416385)
松井 文彦 分子科学研究所, 極端紫外光研究施設, 主任研究員 (60324977)
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| Budget Amount *help |
¥143,780,000 (Direct Cost: ¥110,600,000、Indirect Cost: ¥33,180,000)
Fiscal Year 2018: ¥15,990,000 (Direct Cost: ¥12,300,000、Indirect Cost: ¥3,690,000)
Fiscal Year 2017: ¥33,540,000 (Direct Cost: ¥25,800,000、Indirect Cost: ¥7,740,000)
Fiscal Year 2016: ¥34,060,000 (Direct Cost: ¥26,200,000、Indirect Cost: ¥7,860,000)
Fiscal Year 2015: ¥31,980,000 (Direct Cost: ¥24,600,000、Indirect Cost: ¥7,380,000)
Fiscal Year 2014: ¥28,210,000 (Direct Cost: ¥21,700,000、Indirect Cost: ¥6,510,000)
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| Outline of Final Research Achievements |
The purpose of this study is to perform photoelectron holography of various materials, where local structures of dopant impurity sites, catalytically active sites, and interfaces perform their important functions.Most of the studies were performed at the two soft-x-ray beamlines at SPring-8 and some parts were performed at Swiss Light Source. Before starting online measurements at the above beamline, offline measurements without synchrotron radiation are also very important to obtain high quality data. In this project, we achieved the following.
1. Discrimination imaging of active sites dependent on chemical bonding conditions using high energy resolution devices.: 2. Pinpoint analysis using a micron-sized beam: 3. Time-resolved dynamical analysis under applying external field.
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