Analysis on Extension of Lean-limit by Using Ultra-short Pulse-Controlled Low Temperature Plasma
Project/Area Number |
15K05818
|
Research Category |
Grant-in-Aid for Scientific Research (C)
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Allocation Type | Multi-year Fund |
Section | 一般 |
Research Field |
Thermal engineering
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Research Institution | Chiba University |
Principal Investigator |
|
Co-Investigator(Renkei-kenkyūsha) |
TANOUE Kimitoshi 大分大学, 理工学部, 教授 (60284783)
|
Project Period (FY) |
2015-04-01 – 2018-03-31
|
Project Status |
Completed (Fiscal Year 2017)
|
Budget Amount *help |
¥4,810,000 (Direct Cost: ¥3,700,000、Indirect Cost: ¥1,110,000)
Fiscal Year 2017: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2016: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
Fiscal Year 2015: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
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Keywords | 低温プラズマ / 燃焼改善 / 着火 / 熱機関 / 希薄限界改善 / 極短パルス制御 |
Outline of Final Research Achievements |
As the features of repetitive low temperature plasma, the following three assumptions were made in this study; i) the length of pulse can change the supply energy, ii) the effect of radical can be controlled by pulse timing and interval, and iii) the effect of plasma formation is controlled by the gradient of voltage per pulse duration. The evaluation was carried out. As a result, i) and ii) were experimentally proved. Regarding iii), the increase of gradient of voltage per pulse duration does not necessarily improve the performance.
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Report
(4 results)
Research Products
(4 results)