| Project/Area Number |
15K13364
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| Research Category |
Grant-in-Aid for Challenging Exploratory Research
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| Allocation Type | Multi-year Fund |
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| Research Field |
Thin film/Surface and interfacial physical properties
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| Research Institution | Osaka University |
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Principal Investigator |
Abo Satoshi 大阪大学, 基礎工学研究科, 助教 (60379310)
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| Project Period (FY) |
2015-04-01 – 2017-03-31
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| Project Status |
Completed (Fiscal Year 2016)
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| Budget Amount *help |
¥3,640,000 (Direct Cost: ¥2,800,000、Indirect Cost: ¥840,000)
Fiscal Year 2016: ¥2,210,000 (Direct Cost: ¥1,700,000、Indirect Cost: ¥510,000)
Fiscal Year 2015: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
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| Keywords | 走査プローブ顕微鏡 / 原子間力顕微鏡 / 電界誘起酸素エッチング / 電子ビーム誘起堆積法 / 電子ビーム誘起堆積 / 電界エッチング |
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| Outline of Final Research Achievements |
To improve the spacial resolution of the atomic force microscope (AFM), we aimed to develop a AFM probe self-sharpening process by using applied techniques of electric field induced oxygen etching and electron beam induced deposition.
With the applied technique of the electric field oxygen etching, the probe shape was not changed by the high voltage up to 30 kV in helium and oxygen atmosphere. With the applied technique of the electron beam induced deposition, the sharpened W wires by electrochemical etching are faced each other and electrons were emitted from the cathode W wire to the anode W wire. The tip shape of the cathode W wire was changed by electron emission in organometallic atmosphere.
The above shows the possibility of the probe self-sharpening process.
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