| Project/Area Number |
16K14253
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| Research Category |
Grant-in-Aid for Challenging Exploratory Research
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| Allocation Type | Multi-year Fund |
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| Research Field |
Electron device/Electronic equipment
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| Research Institution | Toyohashi University of Technology |
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Principal Investigator |
Fukuda Mitsuo 豊橋技術科学大学, 工学(系)研究科(研究院), 教授 (50378262)
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| Project Period (FY) |
2016-04-01 – 2018-03-31
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| Project Status |
Completed (Fiscal Year 2017)
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| Budget Amount *help |
¥3,640,000 (Direct Cost: ¥2,800,000、Indirect Cost: ¥840,000)
Fiscal Year 2017: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000)
Fiscal Year 2016: ¥2,860,000 (Direct Cost: ¥2,200,000、Indirect Cost: ¥660,000)
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| Keywords | 表面プラズモン / 光回路 / 光配線 / 光デバイス / 導波路 / マイクロ・ナノデバイス / フォトニックネットワーク |
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| Outline of Final Research Achievements |
The aim of this study is to develop plasmonic metal wiring networks merged with electronic ICs on a silicon substrate. Some low-loss plasmonic waveguides was designed and fabricated, and the low-loss waveguide structure was clarified by comparing their characteristics. The cross-wiring configuration of the two low-loss waveguides was designed by introducing two multimode interferometers (multimode waveguide having the same structure as the single mode waveguide except for the width) to the cross point, and its low crosstalk characteristics were experimentally confirmed. These wiring structures were expanded to plasmonic multiplexer and demultiplexer operating at 1.31- and 1.55-μm-wavelength bands, and their primitive performances were experimentally confirmed. From these results, it can be said that a primitive configuration of plasmonic metal wiring networks were developed for plasmonic integrated circuits.
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