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Investigation of Deep Levels in III-V Semiconductors Crystal using Photo Capacitance Method

Research Project

Project/Area Number 16K18077
Research Category

Grant-in-Aid for Young Scientists (B)

Allocation TypeMulti-year Fund
Research Field Electronic materials/Electric materials
Research InstitutionNagoya University

Principal Investigator

Deki Manato  名古屋大学, 未来材料・システム研究所, 助教 (80757386)

Project Period (FY) 2016-04-01 – 2019-03-31
Project Status Completed (Fiscal Year 2018)
Budget Amount *help
¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000)
Fiscal Year 2018: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2017: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)
Fiscal Year 2016: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Keywords窒化ガリウム / 深い準位 / DLTS / DLOS / SSPC / MOSFET / 界面準位 / GaN SBD / GaN-MIS / Power Device / Deep Levels / GaN / SBD / 電子工学 / 絶縁膜 / 電子・電気材料 / 電子デバイス・機器 / 表面・界面物性
Outline of Final Research Achievements

We investigated deep levels in nitride semiconductors crystal using DLTS and photo capacitance methods. We prepared n-type schottky barrier diodes and MOS capacitors with Al2O3 gate insulators. DLTS and Photo capacitance measurement systems were fabricated, and deep levels which more than 1.5eV were detected by photo capacitance method. In addition, we measured interface state density in Al2O3/GaN interface. Hysteresis of CV curve and VFB were decreased by O3/UV exposure process for 1min. From the XPS measurements, Ga2Ox can improve interface property by this process. Finally, channel mobility of DMOSFET increased with O3/UV exposure process.

Academic Significance and Societal Importance of the Research Achievements

これまでの光容量法に関する報告では、欠陥密度の光子エネルギー依存性を測定する際に、1つの光子エネルギーあたり5分程度の測定時間を要していたが、本測定では0.5sec程度の時間スケールで静電容量の過渡応答を測定するため、測定時間を短縮可能であり、研究の加速化が図れる。今回申請者が提案した装置を用いることで、DLOS、DLTS、およびMCTSから得られた欠陥準位とデバイス特性との対応が取れると予想される。一方で、これらの測定手法を統合的に用いて GaNデバイス中の結晶欠陥分布と起源を明らかにする報告は無く、世界に先駆けてGaNパワーデバイス実現に向けた意義ある研究と言える。

Report

(4 results)
  • 2018 Annual Research Report   Final Research Report ( PDF )
  • 2017 Research-status Report
  • 2016 Research-status Report
  • Research Products

    (8 results)

All 2018 2017

All Presentation (8 results) (of which Int'l Joint Research: 5 results,  Invited: 2 results)

  • [Presentation] Improvement of Electrical Stability of ALD-Al203/GaN Interface by UV/03 Oxidation and Postdeposition Annealing2018

    • Author(s)
      Manato Deki、Kazushi Sone、Kenta Watanabe, Fumiya Watanabe, Kentaro Nagamatsu, Atsushi Tanaka, Maki Kushimoto, Shugo Nitta, Yoshio Honda, and Hiroshi Amano
    • Organizer
      International Symposium on Growth of III-Nitrides
    • Related Report
      2018 Annual Research Report
    • Int'l Joint Research
  • [Presentation] オフ角を有するm面GaN基板上GaN-MOSキャパシタの界面準位評価2018

    • Author(s)
      出来真斗,安藤悠人,渡邉浩崇,田中敦之,久志本真希,新田州吾,本田善央,天野浩
    • Organizer
      第10回ナノ構造・エピタキシャル成長講演会
    • Related Report
      2018 Annual Research Report
  • [Presentation] Crystal plane dependence of interface states density in c- and m-plane GaN MOS capacitors2018

    • Author(s)
      Manato Deki, Yuto Ando, Hirotaka Watanabe, Atsushi Tanaka, Maki Kushimoto, Shugo Nitta, Yoshio Honda1, and Hiroshi Amano
    • Organizer
      第79回応用物理学会 秋季学術講演回
    • Related Report
      2018 Annual Research Report
    • Invited
  • [Presentation] GaN表面への酸化プロセスがALD-Al2O3/GaN界面の電気特性に与える影響2018

    • Author(s)
      出来真斗,曾根和詩,永松謙太郎,田中敦之,久志本真希,新田州吾,本田善央,天野浩
    • Organizer
      第65回応用物理学会春季学術講演会
    • Related Report
      2017 Research-status Report
  • [Presentation] Crystal Plane Dependence of Interface States Density in c- and m-plane GaN MOS Capacitors2017

    • Author(s)
      Manato Deki, Kazushi Sone, Junya Matsushita, Kentarou Nagamatsu, Atsushi Tanaka, Maki Kushimoto, Shugo Nitta, Yoshio Honda, Hiroshi Amano
    • Organizer
      12th International Conference on Nitride Semiconductors
    • Place of Presentation
      France
    • Year and Date
      2017-07-24
    • Related Report
      2016 Research-status Report
    • Int'l Joint Research
  • [Presentation] Crystal Plane Dependence of Interface States Density in c- and m-plane GaN MOS Capacitors2017

    • Author(s)
      M. Deki, K.Sone, J. Matsushita, K.Nagamatsu, A. Tanaka, M. Kushimoto, S. Nitta, Y. Honda, and H. Amano
    • Organizer
      12th International Conference on Nitride Semiconductors
    • Related Report
      2017 Research-status Report
    • Int'l Joint Research
  • [Presentation] Deep Levels in Homoepitaxial m-plane GaN Schottky Barrier Diodes2017

    • Author(s)
      M. Deki, Y. Ando, K.Nagamatsu, A. Tanaka, M. Kushimoto, S. Nitta, Y. Honda, and H. Amano
    • Organizer
      10th International Workshop on Bulk Nitride Semiconductors
    • Related Report
      2017 Research-status Report
    • Int'l Joint Research / Invited
  • [Presentation] Crystal Plane Dependence of Interface States Density in c- and m-plane GaN MOS Capacitors2017

    • Author(s)
      M. Deki, K.Nagamatsu, A. Tanaka, M. Kushimoto, S. Nitta, Y. Honda, and H. Amano
    • Organizer
      International Conference on Materials and Systems for Sustainability 2017
    • Related Report
      2017 Research-status Report
    • Int'l Joint Research

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Published: 2016-04-21   Modified: 2020-03-30  

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