| Co-Investigator(Kenkyū-buntansha) |
ONO Takahito 東北大学, 大学院・工学研究科, 教授 (90282095)
TANAKA Syuji 東北大学, 大学院・工学研究科, 准教授 (00312611)
TOTSU Kentaro 東北大学, マイクロシステム融合研究センター, 准教授 (60374956)
KAWAI Yusuke 東北大学, 大学院・工学研究科, 助教 (20451536)
MIYASHITA Hidetoshi 東北大学, マイクロシステム融合研究センター, 助教 (00401258)
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| Budget Amount *help |
¥110,240,000 (Direct Cost: ¥84,800,000、Indirect Cost: ¥25,440,000)
Fiscal Year 2011: ¥4,810,000 (Direct Cost: ¥3,700,000、Indirect Cost: ¥1,110,000)
Fiscal Year 2010: ¥13,390,000 (Direct Cost: ¥10,300,000、Indirect Cost: ¥3,090,000)
Fiscal Year 2009: ¥25,220,000 (Direct Cost: ¥19,400,000、Indirect Cost: ¥5,820,000)
Fiscal Year 2008: ¥31,720,000 (Direct Cost: ¥24,400,000、Indirect Cost: ¥7,320,000)
Fiscal Year 2007: ¥35,100,000 (Direct Cost: ¥27,000,000、Indirect Cost: ¥8,100,000)
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| Research Abstract |
The fabrication method for emitter with carbon nanotube at the top of the tip, optically controllable emitter, micro stage and the novel method for fabricate electro static electron rends are studied as one of the components of the massive parallel electron beam lithography system. With these components, prototype of the EB system was fabricated.
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