| Project/Area Number |
19560323
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Electronic materials/Electric materials
|
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| Research Institution | Kanazawa Institute of Technology |
|---|
Principal Investigator |
SAKUDO Noriyuki Kanazawa Institute of Technology, 工学部, 教授 (20267719)
|
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| Co-Investigator(Kenkyū-buntansha) |
YAJIMA Zenjiro 金沢工業大学, 工学部, 教授 (60148145)
KISHI Yoichi 金沢工業大学, 工学部, 准教授 (70265370)
IKENAGA Noriaki 金沢工業大学, ものづくり研究所, 研究員 (30512371)
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| Project Period (FY) |
2007 – 2009
|
| Project Status |
Completed (Fiscal Year 2009)
|
| Budget Amount *help |
¥4,550,000 (Direct Cost: ¥3,500,000、Indirect Cost: ¥1,050,000)
Fiscal Year 2009: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2008: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2007: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
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| Keywords | 質量分析 / フェロイック材料 / 組成制御 / スパッタリング / 形状記憶合金 / プラズマ加工 / 構造・機能材料 / マイクロ・ナノデバイス / スパックリング |
|---|
| Research Abstract |
Sputtering deposition is used even for synthesizing ferroic material such as shape-memory alloys, since it is comparatively easy to deposit a thin film of metallic compound using plural sputter sources. However, highly precise composition control is expected for further application of ferroic materials to industry, because the specific properties of the materials are changeable strongly depending on the material's composition. In this study we proposed a new composition-control method which uses mass spectrometry. We achieved 0.5 atomic percent of precision, although conventional methods could achieve 1.0 percent at most.
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