Study on the suppression mechanism of crystal defects by the doping of the impurities in the melt during the crystal growth

• Project/Area Number: 20550173
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Inorganic industrial materials
• Research Institution: University of Yamanashi
• Principal Investigator: WATAUCHI Satoshi University of Yamanashi, 大学院・医学工学総合研究部, 准教授 (30293442)
• Project Period (FY): 2008 – 2010
• Project Status: Completed (Fiscal Year 2010)
• Budget Amount: ¥4,940,000 (Direct Cost: ¥3,800,000、Indirect Cost: ¥1,140,000); Fiscal Year 2010: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000); Fiscal Year 2009: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000); Fiscal Year 2008: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
• Keywords: 結晶・多結晶材料 / ルチル単結晶 / 界面形状 / エッチピット密度 / 酸化チタン(ルチル) / 単結晶 / 浮遊帯域溶融法 / 不純物効果 / 結晶欠陥 / 欠陥評価 / エッチピット / 固液界面形状 / 光透過率

Research Abstract

I started this project to clarify the mechanism of the unique impurity doping effects on the crystal growth of rutile. Following results were clarified by the careful characterization of the crystal defects. The impurity elements doped in the melts were detected in the grown crystals at the level of ppm. The etch pit density (EPD) was high at the periphery of the grown crystal and low at the center. The order of EPD was reduced by the impurity doping from ～10^5/cm^2 to ～10^4/cm^2. The EPD was also significantly affected by the solid-liquid interface shape during the crystal growth.

Research Products

• [Journal Article] Isao Tanaka “Effects of the diameter of rutile (TiO2) single crystals grown using tilting-mirror-type infrared heating image furnace on solid-liquid interface and etch pit density" (2011)
  • Author(s): Md.Abdur Razzaque Sarker, Satoshi Watauchi, Masanori Nagao, Takashi Watanabe, Isamu Shindo
  • Journal Title: Journal of Crystal Growth Vol.317 Pages: 135-138
  • Peer Reviewed
• [Journal Article] Effects of the diameter of rutile (TiO_2) single crystals grown using tilting-mirror-type infrared heating image furnace on solid-liquid interface and etch pit density (2011)
  • Author(s): Md.A.R.Sarker
  • Journal Title: Journal of Crysta1 Growth Volume: 317 Pages: 135-138
  • Peer Reviewed
• [Journal Article] Isao Tanaka “Reduced Etch Pit Density of Rutile (TiO2) Single Crystals by Growth Using a Tilting-Mirror-Type Infrared Heating Image Furnace" (2010)
  • Author(s): Md.Abdur Razzaque Sarker, Satoshi Watauchi, Masanori Nagao, Takashi Watanabe, Isamu Shindo
  • Journal Title: Crystal Growth & Design Vol.10 Pages: 3929-3930
  • Peer Reviewed
• [Journal Article] Isao Tanaka “Effects of tilting mirrors on the solid-liquid interface during floating zone growth using tilting-mirror-type infrared-heating image furnace" (2010)
  • Author(s): Md.Abdur Razzaque Sarker, Satoshi Watauchi, Masanori Nagao, Takashi Watanabe, Isamu Shindo
  • Journal Title: Journal of Crystal Growth Vol.312, Issues 12-13 Pages: 2008-2011
  • Peer Reviewed
• [Journal Article] Reduced Etch Pit Density of Rutile (TiO_2) Single Crystals by Growth Using a Tilting-Mirror-Type Infrared Heating Image Furnace (2010)
  • Author(s): Md.A.R.Sarker
  • Journal Title: Crystal Growth and Design Volume: 10 Pages: 3929-3930
  • Peer Reviewed
• [Journal Article] Effects of tilting mirrors on the solid-liquid interface during floating zone growth using tiltig-mirror-type infrared-heating image furnace (2010)
  • Author(s): Md.A.R.Sarker
  • Journal Title: Journal of Crystal Growth Volume: 312 Pages: 2008-2011
  • Peer Reviewed
• [Presentation] Isao Tanaka "Tilting effects of mirrors during crystal growth by infrared heating floating zone method" (2010)
  • Author(s): Satoshi Watauchi, Md.Abdur Razzaque Sarker, Masanori Nagao, Takashi Watanabe, Isamu Shindo
  • Organizer: 2010 International Symposium on Crystal Growth
  • Place of Presentation: (韓国,ソウル)CI-25 (招待講演)
  • Year and Date: 2010-11-09
• [Presentation] Tilting effects of mirrors during crystal growth by infrared heating floating zone method (2010)
  • Author(s): S.Watauchi
  • Organizer: 2010 International Symposium on Crystal Growth
  • Place of Presentation: ソウル市,韓国
  • Year and Date: 2010-11-09
• [Presentation] Isao Tanaka “Effects of tilting the mirror of infrared heating image furnace on the crystal growth by floating zone method" (2010)
  • Author(s): Satoshi Watauchi, Md.Abdur Razzaque Sarker, Masanori Nagao, Takashi Watanabe, Isamu Shindo
  • Organizer: IX International Conference of Polish Society for Crystal Growth
  • Place of Presentation: (ポーランド,グダニスク)L14(招待講演)
  • Year and Date: 2010-05-26
• [Presentation] Effects of tilting the mirror of infrared heating image furnace on the crystal growth by floating zone method (2010)
  • Author(s): S.Watauchi
  • Organizer: IX International Conference of Polish Society for Crystal Growth
  • Place of Presentation: グダニスク市,ポーランド
  • Year and Date: 2010-05-26
• [Presentation] Solid-liquid interface during floating zone growth using tilting-mirror-type infrared heating image furnace (2009)
  • Author(s): S.Watauchi, 他5名
  • Organizer: RIKEN Workshop on "Emergent Phenomena of Correlated Materials"
  • Place of Presentation: 理化学研究所(和光市)
  • Year and Date: 2009-12-04
• [Presentation] 傾斜鏡型赤外線加熱炉を用いたルチル単結晶の育成と結晶欠陥評価 (2009)
  • Author(s): 綿打敏司
  • Organizer: 第39回結晶成長国内会議
  • Place of Presentation: (名古屋)12aC03(招待講演)
  • Year and Date: 2009-11-12
• [Presentation] 傾斜鏡型赤外綿加熱炉を用いたルチル単結晶の育成と結晶欠陥評価 (2009)
  • Author(s): 綿打敏司, 他5名
  • Organizer: 日本結晶成長学会第39回結晶成長国内会議(招待)
  • Place of Presentation: 名古屋大学(名古屋市)
  • Year and Date: 2009-11-12
• [Presentation] Md.Abdura Razzaque Sarker, 長尾雅則, 田中功, 渡辺崇司, 進藤勇 「傾斜鏡型赤外線加熱浮遊帯域溶融法によるルチル単結晶の育成」日本セラミックス協会 (2009)
  • Author(s): 綿打敏司
  • Organizer: 第22回秋季シンポジウム
  • Place of Presentation: (松山)1K17(招待講演)
  • Year and Date: 2009-09-16
• [Presentation] 傾斜鏡型赤外綿加熱浮遊帯域溶融法によるルチル単結晶の育成 (2009)
  • Author(s): 綿打敏司, 他5名
  • Organizer: 日本セラミックス協会第22回秋季シンポジウム(招待)
  • Place of Presentation: 愛媛大学(松山市)
  • Year and Date: 2009-09-14
• [Presentation] アブドララザクサカール, 長尾雅則, 渡辺崇司, 進藤勇, 田中功, 「傾斜鏡型赤外線加熱浮遊帯域溶融法による結晶育成おけるFeedサイズ効果」 (2009)
  • Author(s): 綿打敏司
  • Organizer: 2009年秋季第70回応用物理学学術講演会
  • Place of Presentation: (富山)8p-N-10(一般講演)
  • Year and Date: 2009-09-08
• [Presentation] 傾斜鏡型赤外綿加熱浮遊帯域溶融法による結晶育成おけるFeedサイズ効果 (2009)
  • Author(s): 綿打敏司, 他5名
  • Organizer: 第70回応用物理学会学術講演会
  • Place of Presentation: 富山大学(富山市)
  • Year and Date: 2009-09-08
• [Presentation] Y添加溶媒を用いたルチル単結晶のTSFZ育成とその結晶欠陥評価 (2008)
  • Author(s): 深沢真司, 長尾雅則, 綿打敏司, 田中功
  • Organizer: 第3回日本フラックス成長研究発表会
  • Place of Presentation: 東京都世田谷区
  • Year and Date: 2008-12-19
• [Presentation] Effects of the focusing on growth of rutile crystals byinclined focusing floating zone (IFFZ) method (2008)
  • Author(s): Md. Abdur Razzaaue Sarker, Takashi Watanabe, Satoshi Watauchi, Masanori Nagao, Isao Tanaka
  • Organizer: 第38回結晶成長国内会議
  • Place of Presentation: 宮城県仙台市
  • Year and Date: 2008-11-06
• [Presentation] 傾斜集光加熱FZ育成による固液界面形状制御 (2008)
  • Author(s): 綿打敏司, SARKER Md., Abdur Razzaque, 長尾雅則, 渡辺崇司, 田中功
  • Organizer: 第69回応用物理学学術講演会
  • Place of Presentation: 愛知県春日井市
  • Year and Date: 2008-09-03
• [Presentation] Growth of Rutile (TiO_2) Single Crystals by Traveling Floating Zone Method using Yttrium Doped Solvents (2008)
  • Author(s): S. Watauchi, M. Fukasawa, I. Tanaka
  • Organizer: The 4^<th> Asian Conference on Crystal Growth and Crystal Technology
  • Place of Presentation: Sendai (Japan)
  • Year and Date: 2008-05-23
• [Presentation] Solid-liquid interface in floating zone growth of rutile crystal with variation of focusing angle (2008)
  • Author(s): Md. Abdur Razzague Sarker, Satoshi Watauchi, Isao Tanaka
  • Organizer: XXI Congress of the international Union of Crystallography
  • Place of Presentation: Osaka (Japan)
• [Remarks] ホームページ等
  • URL: http://www.inorg.yamanashi.ac.jp/ccst/laboratories/tanaka-lab/home-j.html
• [Remarks]
  • URL: http://www.inorg.yamanashi.ac.jp/ccst/laboratories/tanaka-lab/home-j.html