Shape formation in silicon surface by transfer photo-etching using solid phase reaction at fluorination agent-silicon interface.
| Project/Area Number |
20560107
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Production engineering/Processing studies
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| Research Institution | Osaka University |
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Principal Investigator |
UCHIKOSHI Junichi Osaka University, 工学研究科, 助教 (90273581)
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| Co-Investigator(Kenkyū-buntansha) |
MORITA Mizuho 大阪大学, 工学研究科, 教授 (50157905)
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| Project Period (FY) |
2008 – 2010
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| Project Status |
Completed (Fiscal Year 2010)
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| Budget Amount *help |
¥4,680,000 (Direct Cost: ¥3,600,000、Indirect Cost: ¥1,080,000)
Fiscal Year 2010: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000)
Fiscal Year 2009: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
Fiscal Year 2008: ¥2,340,000 (Direct Cost: ¥1,800,000、Indirect Cost: ¥540,000)
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| Keywords | フッ素化剤 / N-フルオロピリジニウム塩 / 光エッチング / 光転写 / シリコン / 3次元形状 / 半導体表面 / 形状創成 / 塗布 / エッチング / インクジェット / 半導体 / 表面 / 界面 |
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| Research Abstract |
A new photo-etching method with N-fluoropyridinium salts is proposed in this study. Si is etched by applying N-fluoropyridinium salts to its surface and exposing the surface to light. The etched surface using liquid N-fluoropyridinium salts is smoother than that using solid N-fluoropyridinium salts. The etching depth increases with exposure time. H-terminated hydrophobic Si is easier to etch than OH-terminated hydrophilic Si. SiF_4 is produced by photo-etching. The number of processes in the new photo-etching method is fewer than that in the lithography and etching. The etching depth increases with light intensity. A ditch with different depths and a spherical surface are formed by exposing to light with different intensities at a time. It is expected to form arbitrary three-dimensional shape in a silicon surface by controlling light intensity distribution.
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Report
(4 results)
Research Products
(26 results)
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[Presentation] Photo-etching of Silicon by N-Fluoropyridinium Salt2009
Author(s)
Shigeharu Goto, Kentaro Tsukamoto, Tatsuya Kawase, Noritaka Ajari, Takabumi Nagai, Kenji Adachi, Junichi Uchikoshi, Mizuho Morita
Organizer
Abstracts of 216th Meeting of The Electrochemical Society
Place of Presentation
Vienna, Austria
Year and Date
2009-10-06
Related Report
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[Presentation] Surface Shape Measurements of Silicon Photo-etched with N-fluoropyridinium salts by Near-infrared Transmission Interferometry2009
Author(s)
Junichi Uchikoshi, Noritaka Ajari, Kentaro Tsukamoto, Shigeharu Goto, Takabumi Nagai, Kenji Adachi, Kenta Arima, Mizuho Morita
Organizer
Extended Abstracts of International Workshop on X-ray Mirror Design, Fabrication, and Metrology
Place of Presentation
Suita, Osaka, Japan
Year and Date
2009-09-22
Related Report
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