Research Project
Grant-in-Aid for Young Scientists (B)
I have established the method of forming polycrystalline silicon (poly-Si) films without serious thermal damage onto glass substrates by crystallizing precursor amorphous Si (a-Si) films formed by sputtering, safer than chemical vapor deposition (CVD). I have clarified that sputtered a-Si films can be crystallized without Cr adhesion films and show a crystallization mechanism similar to that shown in CVD a-Si films.
All 2011 2010 Other
All Journal Article (4 results) (of which Peer Reviewed: 4 results) Presentation (8 results) Remarks (2 results)
Proceedings of the 7th Thin-Films Materials and Devices Meeting
Pages: 110107015-110107015
Proceedings of the Seventh Thin-Films Materials and Devices Meeting
Journal of Nanoscience and Nanotechnology
Volume: (掲載確定)
Journal of Nanoscience and Nanotechnology in press
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