FORMATION OF THREE-DIMENSIONAL SHAPES IN SEMICONDUCTOR SURFACES FOR FUNCTIONAL DEVICES THROUGH PHOTOCHEMICAL REACTION WITH ELECTROPHILIC FLUORINATION AGENTS

• Project/Area Number: 26289017
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Partial Multi-year Fund
• Section: 一般
• Research Field: Production engineering/Processing studies
• Research Institution: Osaka University
• Principal Investigator: MORITA Mizuho 大阪大学, 工学(系)研究科(研究院), 教授 (50157905)
• Co-Investigator(Kenkyū-buntansha): 川合 健太郎 大阪大学, 工学(系)研究科(研究院), 助教 (90514464)
• Co-Investigator(Renkei-kenkyūsha): ADACHI Kenji 大阪大学, 大学院工学研究科, 招へい教授 (60521739)
• Project Period (FY): 2014-04-01 – 2017-03-31
• Project Status: Completed (Fiscal Year 2016)
• Budget Amount: ¥16,510,000 (Direct Cost: ¥12,700,000、Indirect Cost: ¥3,810,000); Fiscal Year 2016: ¥5,070,000 (Direct Cost: ¥3,900,000、Indirect Cost: ¥1,170,000); Fiscal Year 2015: ¥5,330,000 (Direct Cost: ¥4,100,000、Indirect Cost: ¥1,230,000); Fiscal Year 2014: ¥6,110,000 (Direct Cost: ¥4,700,000、Indirect Cost: ¥1,410,000)
• Keywords: 半導体表面 / フッ素化剤 / 三次元形状 / 光エッチング / ナノマイクロ加工

Outline of Final Research Achievements

Convex spherical shapes have been formed in silicon surfaces by photoetching with N-fluoropyridinium salts using a system with a projector and reduction optics. Silicon optical-waveguides with a vertical-bend structure have been fabricated using photoetching　with the system and the vertical transmission of light passed through a horizontal waveguide with the bend structure has been demonstrated. A multiple beam interference system has been developed and silicon surface textures with a grid-like pattern have been formed by photoetching with the three beams interference system.

Research Products

• [Journal Article] Photoetching method that provides improved silicon-on-insulator layer thickness uniformity in a defined area (2017)
  • Author(s): Yuki Miyata, Yasunori Nakamukai, Cassia Tiemi Azevedo, Miho Morita, Junichi Uchikoshi, Kentaro Kawai, Kenta Arima, Mizuho Morita
  • Journal Title: Microelectronic Engineering Volume: 印刷中
  • Peer Reviewed / Int'l Joint Research / Acknowledgement Compliant
• [Journal Article] Effect of metal particles on the Si etching rate with N-fluoropyridinium salts (2016)
  • Author(s): Masaki Otani, Kentaro Kawai, Kentaro Tsukamoto, Takabumi Nagai, Kenji Adachi, Junichi Uchikoshi, Kenta Arima, and Mizuho Morita
  • Journal Title: Japanese Journal of Applied Physics Volume: 55 Issue: 10 Pages: 1080031-3
  • DOI: 10.7567/jjap.55.108003
  • Peer Reviewed
• [Presentation] N-フルオロピリジニウム塩を用いた光エッチングによるSi表面ランダムダブルテクスチャ形成 (2016)
  • Author(s): 熊田 竜也、川合 健太郎、永井 隆文、足達 健二、有馬 健太、森田 瑞穂
  • Organizer: 応用物理学会
  • Place of Presentation: 東京工業大学 大岡山キャンパス（東京都目黒区）
  • Year and Date: 2016-03-19
• [Presentation] Texturing Low Reflecting Surface of Random Double Inverted Pyramids Using N-fluoropyridinium Salt (2014)
  • Author(s): Tatsuya Kumada, Kentaro Kawai, Toshinori Hirano, Masaki Otani, Takabumi Nagai, Kenji Adachi, Kenta Arima, and Mizuho Morita
  • Organizer: 40th IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE
  • Place of Presentation: Denver(USA)
  • Year and Date: 2014-06-11
• [Presentation] Mask-less formation of anti-reflecting inverted-pyramids to single-crystal Si solar cell by N-fluoropyridinium salts (2014)
  • Author(s): Kentaro Kawai, Tatsuya Kumada, Takabumi Nagai, Kenji Adachi, Kenta Arima and Mizuho Morita
  • Organizer: EMN Summer Meeting
  • Place of Presentation: Cancun(Mexico)
  • Year and Date: 2014-06-10
  • Invited
• [Presentation] Development of Silicon Photo-Etching with N-Fluoropyridinium Salts (2014)
  • Author(s): Kenji Adachi, Takabumi Nagai, Junichi Uchikoshi, Masaki Otani, Toshinori Hirano, Kentaro Kawai, Mizuho Morita
  • Organizer: INTERNATIONAL CONFERENCE ON FLUORINE CHEMISTRY
  • Place of Presentation: Pacifico Yokohama(Kanagawa・Yokohama)
  • Year and Date: 2014-05-29
• [Patent(Industrial Property Rights)] エッチング処理用組成物及びエッチング処理方法 (2016)
  • Inventor(s): 川合 健太郎、森田 瑞穂、足達 健二、永井 隆文
  • Industrial Property Rights Holder: ダイキン工業株式会社、国立大学法人大阪大学
  • Industrial Property Rights Type: 特許
  • Filing Date: 2016-03-04
  • Overseas
• [Patent(Industrial Property Rights)] エッチング処理用組成物及びエッチング処理方法 (2015)
  • Inventor(s): 足達 健二、永井 隆文、森田 瑞穂、川合 健太郎
  • Industrial Property Rights Holder: ダイキン工業株式会社、国立大学法人大阪大学
  • Industrial Property Rights Type: 特許
  • Industrial Property Number: 2015-043031
  • Filing Date: 2015-03-04