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Study of sub-10nm alignment by fluorescence interference fringes

Research Project

Project/Area Number 26630016
Research Category

Grant-in-Aid for Challenging Exploratory Research

Allocation TypeMulti-year Fund
Research Field Production engineering/Processing studies
Research InstitutionTohoku University

Principal Investigator

NAKAGAWA Masaru  東北大学, 多元物質科学研究所, 教授 (10293052)

Research Collaborator ISHITO Yota  
MATSUBARA Shinya  
KIKUCHI Eri  
ITO Shunya  
Project Period (FY) 2014-04-01 – 2016-03-31
Project Status Completed (Fiscal Year 2015)
Budget Amount *help
¥3,900,000 (Direct Cost: ¥3,000,000、Indirect Cost: ¥900,000)
Fiscal Year 2015: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2014: ¥2,340,000 (Direct Cost: ¥1,800,000、Indirect Cost: ¥540,000)
Keywords生産技術 / アライメント / ナノ加工 / マイクロ・ナノデバイス / ナノインプリント / 蛍光 / ナノ材料 / 高分子合成 / 超薄膜 / 表面・界面物性 / 材料加工・処理 / 高分子構造・物性 / 表面電位
Outline of Final Research Achievements

The method of in-liquid optical alignment for adjusting a silica mold position to an underneath silicon substrate in ultraviolet nanoimprinting was studied by fluorescence microscopy using fluorescent UV-curable resins. In conventional reflection-mode optical microscope observation, alignment marks of concave patterns of a silica mold disappeared owing to matching refractive indexes of the resin and silica mold when the mold recesses were completely filled with the fluid resin. In contrast, the alignment marks could be visualized by fluorescence microscopy using the fluorescent resin. The fluorescence detection had the advantage of no need of any surface modification of the silica mold. Several issues were made clear during studies of course alignment with cross bars and fine alignment with interference fringes for achieving sub-10 nm alignment.

Report

(3 results)
  • 2015 Annual Research Report   Final Research Report ( PDF )
  • 2014 Research-status Report
  • Research Products

    (12 results)

All 2016 2015 2014 Other

All Presentation (9 results) (of which Invited: 6 results) Remarks (2 results) Patent(Industrial Property Rights) (1 results)

  • [Presentation] ナノインプリントリソグラフィの総合科学技術の創出に向けて2016

    • Author(s)
      中川 勝
    • Organizer
      高分子学会有機エレクトロニクス研究会
    • Place of Presentation
      東京都(化学会館ホール)
    • Year and Date
      2016-01-21
    • Related Report
      2015 Annual Research Report
    • Invited
  • [Presentation] ナノインプリントリソグラフィにおけるSub-20nmでの課題2016

    • Author(s)
      中川勝
    • Organizer
      第6回リソグラフィ将来技術調査専門委員会
    • Place of Presentation
      東京都(自動車会館)
    • Year and Date
      2016-01-15
    • Related Report
      2015 Annual Research Report
    • Invited
  • [Presentation] 界面機能分子制御に立脚したナノインプリントリソグラフィ2015

    • Author(s)
      中川勝
    • Organizer
      2015年度精密工学会秋季大会 学術講演会
    • Place of Presentation
      宮城県仙台市(東北大学川内キャンパス)
    • Year and Date
      2015-09-05
    • Related Report
      2015 Annual Research Report
    • Invited
  • [Presentation] 界面機能分子制御に立脚したナノインプリントリソグラフィ2015

    • Author(s)
      中川勝
    • Organizer
      先端ナノデバイス・材料テクノロジー第151委員会 平成27年度 第1回合同研究会
    • Place of Presentation
      東京都(早稲田大学西早稲田キャンパス)
    • Year and Date
      2015-07-03
    • Related Report
      2015 Annual Research Report
    • Invited
  • [Presentation] ナノインプリントリソグラフィの科学2015

    • Author(s)
      中川勝
    • Organizer
      第209回フォトポリマー懇話会
    • Place of Presentation
      東京都(東京理科大学森戸記念館)
    • Year and Date
      2015-04-24
    • Related Report
      2015 Annual Research Report
    • Invited
  • [Presentation] Rapid curing for UV-nanoimprinting2014

    • Author(s)
      Yota Ishito, Masaru Nakagawa
    • Organizer
      International Symposium on Integrated Molecular/Materials
    • Place of Presentation
      China, Jiangsu, Nanjing
    • Year and Date
      2014-11-01
    • Related Report
      2014 Research-status Report
  • [Presentation] Investigation of the minimum UV-exposure period for high-throughput UV nanoimprinting2014

    • Author(s)
      Yota Ishito, Masaru Nakagawa
    • Organizer
      13th International Conference on Nanoimprint and Nanoprint Technology (NNT 2014)
    • Place of Presentation
      京都府京都市
    • Year and Date
      2014-10-23
    • Related Report
      2014 Research-status Report
  • [Presentation] ナノインプリントリソグラフィの科学2014

    • Author(s)
      中川勝
    • Organizer
      第63回高分子討論会
    • Place of Presentation
      長崎県長崎市
    • Year and Date
      2014-09-24
    • Related Report
      2014 Research-status Report
    • Invited
  • [Presentation] 光ナノインプリントプロセスの高速化を目指した最短成型時間に関する考察2014

    • Author(s)
      石戸洋太, 中川勝
    • Organizer
      第63回高分子討論会
    • Place of Presentation
      長崎県長崎市
    • Year and Date
      2014-09-24
    • Related Report
      2014 Research-status Report
  • [Remarks] 研究内容

    • URL

      http://www.tagen.tohoku.ac.jp/labo/nakagawa/research.html

    • Related Report
      2015 Annual Research Report
  • [Remarks] 業績リスト

    • URL

      http://www.tagen.tohoku.ac.jp/labo/nakagawa/results.html

    • Related Report
      2015 Annual Research Report
  • [Patent(Industrial Property Rights)] 光硬化性蛍光組成物を用いた位置合わせ方法、インプリント方法およびインプリント装置2015

    • Inventor(s)
      旭化成株式会社, 東北大学
    • Industrial Property Rights Holder
      旭化成株式会社, 東北大学
    • Industrial Property Rights Type
      特許
    • Industrial Property Number
      2015-021538
    • Filing Date
      2015-02-05
    • Related Report
      2014 Research-status Report

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Published: 2014-04-04   Modified: 2018-03-22  

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