• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to project page

1995 Fiscal Year Final Research Report Summary

Phonon Scattering Study of Strain-Effects in Heterostructure.

Research Project

Project/Area Number 05044108
Research Category

Grant-in-Aid for international Scientific Research

Allocation TypeSingle-year Grants
SectionJoint Research
Research InstitutionKyushu Institute of Technology

Principal Investigator

MIYASATO Tatsuro  Dept.of Computor Science & Systems Eng., Kyushu Institute of Technology, Professor, 情報工学部, 教授 (90029900)

Co-Investigator(Kenkyū-buntansha) SAHRAOUI-TAHAR M  School of Physics & Chemistry, Lancaster University., 物質科学部, 研究員
JONES B.k.  School of Physics & Chemistry, Lancaster University., 物質科学部, 上級講師
MEREDITH Dav  ランカスター大学, 物質科学部, 上級講師
WIGMORE J.keith  School of Physics & Chemistry, Lancaster University., 物質科学部, 上級講師
NISHITANI Ryusuke  Dept.of Computor Science & Systems Eng., Kyushu Institute of Technology, 情報工学部, 助教授 (50167566)
ASANO Tanemasa  Center for Microelectronic Systems, Kyushu Institute of Technology., マイクロ化総合技術センター, 教授 (50126306)
MEREDITH David j  School of Physics & Chemistry, Lancaster University.
Project Period (FY) 1993 – 1995
KeywordsSiGe system thin film / high frequency phonon / heat pulse phonon / Al thin film bolometer / strained boundary / RF-sputtering / HEMT / phonon mode conversion / phonon detection
Research Abstract

The most important points in the present joint research is that some essential problems or difficulties should be overcome, which are : (1) precisely controlled heat pulse high frequency phonon generation and (2) high sensitive and quick phonon detection, (3) preparation of good controlled siGe system films, (4) correct data accumulation and their precise analyzes, and their (5) application to electronic devices.
(1) The heater wihch generates high frequency phonons was prpared by photolithography technology with new method and design to get high resolution in time and space. A new technique to connect coaxial cable of 0.5 mmphi to the heater and the bolometer was developed and to avoid the electro-magnetic brake-through into the dtector.
(2) The aluminium thin film bolometer of 10nm thick was evaporated in 5*10^<-6> Torr of oxgen atmosphere, wihch has steep and wide/linear transition slope at 1.35 K,and its sensitivity is far higher than that reported in the past. The crystallographic s … More tructure was revealed to be hexagonal, which is the first obervation and one of remarkable results of the present project. A good reproducibility and its outstanding quality were obtained in oil-free vacuum by turbo-molecular pump andby new photolithography technique by positive-resist process.
(3) SiGe system film was prepared by RF-sputtering method, and a strong mode conversion at strained boundary was observed. But showed that the electric conductivi-tiy was not enough for EEMT,then the materials for HEMT is to be offered by HITACHI and other laboratories.
(4) From the theoretical point, Miyasato and Wigmore developed calculation with A G Kozorezov at Lacaster University, in which we have modelled the scattering of heat pulse from rough surface, as reflection experiment as mentioned above. The effect of long-range irregu-larities was calculated in the eikonal approximation.
As shown above, the technological and theoretical researches of the present project have made a great break-through in the field of interaciton of high frequency phonons with very thin films and/or electrons in it, namely low dimensional electron gas. Less

  • Research Products

    (20 results)

All Other

All Publications (20 results)

  • [Publications] A.G.KOZOREZOV,J.K.WIGMORE & T.MIYASATO.: "Heat Pulse Scattering from Rough Surfaces with Long-range Irregularity." Physica B.(in press). (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] A.G.Kozorezov,T.Miyasato & J.K.Wigmore.: "Heat pulse scattering at rough surface : reflection." J.Phys. : Condens.Matter. 8. 1-14 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y.Sun & T.Miyasato.: "Characterization of Stress in Porous Silicon Films Prepared by Reactive Hydrogen Plasma Sputtering Technique." Jpn.J.Appl.Phys.34. L1248-L1250 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.TONOUCHI,T.MIYASATO,P.HAWKER,T.S.CHENG & V.W.RAMPTON.: "Classical Edge Magnetoplasmon in a GaAs/AlGaAs Two Dimensional Electron System." J.Phys.Soc.Jpn.63. 4499-4505 (1994)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y.SUN,R.NISHITANI & T.MIYASATO.: "Study of the Growth Mechanism of Nanocrystalline Si : H Films Prepared by Reactive Hydrogen Plasma Sputtering of Silicon." Jpn.J.Appl.Phys.33. L1645-L1648 (1994)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.HIGA,T.ASANO & T.MIYASATO.: "Variation of Photoluminescence Properties of Stain-Etched Porous Si with Crystallinity of Starting Polycrystalline Si Films." Jpn.J.Appl.Phys.33. L1733-L1736 (1994)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y.Sun,R.Nishitani & T.Miyasato.: "Study of Hydrogen-Ion Bombardment Effect on the Growth of Si : H Films Prepared by H-Plasma Sputtering of Si." Jpn.J.Appl.Phys.35(in press). (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y.SUN,R.NISHITANI & T.MIYASATO.: "Temperature-Dependent Reaction of RF-Hydrogen-Plasma with Si." Jpn.J.Appl.Phys.33. L1117-L1120 (1994)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y.SUN,R.NISHITANI & T.MIYASATO.: "Study of Sputtering Mechanism of Si with H-Plasama Controlled by Magnetic Field." Jpn.J.Appl.Phys.33. L263-L266 (1994)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.SAKAMA,M.OHMURA,M.TONOUCHI & T.MIYASATO.: "Growth Mech.of ZnS : Mn Films Obtained by H-Plasma Sput. & Its Appl.to a Thin-Film Eluminescent Device." Jpn.J.Appl.Phys.32. 1681-1690 (1993)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] A.G.KOZOREZOV,J.K.WIGMORE & T.MIYASATO.: "Heat Pulse Scattering from Rough Surfaces with Long-range Irregularity." Physica B.(in press). (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] A.G.Kozorezov, T.Miyasato & J.K.Wigmore.: "Heat pulse scattering at rough surface : reflection." J.Phys. : Condens.Matter. 8. 1-14 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y.Sun & T.Miyasato.: "Jpn.J.Appl.Phys." Characterization of Stress in Porous Silicon Films Prepared by Reactive Hydrogen Plasma Sputtering Technique.34. L1248-L1250 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.TONOUCHI,T.MIYASATO,P.HAWKER,T.S.CHENG & V.W.RAMPTON.: "Classical Edge Magnetoplasmon in a GaAs/AlGaAs Two-Dimensional Electron System." J.Phys.Soc.Jpn.63. 4499-4505 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K.HIGA,T.ASANO & T.MIYASATO.: "Variation of Photoluminescence Properties of Stain-Etched Porous Si with Crystallinity of Starting polycrystalline Si Films." Jpn.J.Appl.Phys.33. L1733-L1736 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y.SUN,R.NISHITANI & T.MIYASATO.: "Temperature-Dependent Reaction of RF-Hydrogen-Plasma with Silicon." Jpn.J.Appl.Phys.33. L1117-L1120 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y.Sun, R.Nishitani & T.Miyasato.: "Study of Hydrogen-Ion Bombardment Effect on the Growth of Si : H Films Prepared by Hydrogen Plasma Sputtering of Silicon." Jpn.J.Appl.Phys.35 (in press). (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y.SUN,R.NISHITAI & T.MIYASATO.: "Study of the Growth Mechanism of Nanocrystalline Si : H Films Prepared by Reactive Hydrogen Plasma Sputtering of Silicon." Jpn.J.Appl.Phys.33. L1645-L1648 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y.SUN,R.NISHITANI & T.MIYASATO.: "Study of Sputtering Mechanism of Silicon with Hydrogen Plasma Controlled by Magnetic Field." Jpn.J.Appl.Phys.33. L263-L266 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.SAKAMA,M.OHMURA,M.TONOUCHI & T.MIYASATO.: "Growth Mechanism of ZnS : Mn Films Obtained by Hydrogen Plasma Sputtering and Its Application to a Thin-Film Electroluminescent Device." Jpn.J.Appl.Phys.32. 1681-1690 (1993)

    • Description
      「研究成果報告書概要(欧文)」より

URL: 

Published: 1997-03-04  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi