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1994 Fiscal Year Final Research Report Summary

Removal of Fine Particles from Surfaces by Consecutive Pulse Air Jets

Research Project

Project/Area Number 05452301
Research Category

Grant-in-Aid for General Scientific Research (B)

Allocation TypeSingle-year Grants
Research Field 反応・分離工学
Research InstitutionKanazawa University

Principal Investigator

EMI Hitoshi  Kanazawa University, Faculty of Engineering, Professor, 工学部, 教授 (90025966)

Co-Investigator(Kenkyū-buntansha) OTANI Yoshio  Kanazawa University, Faculty of Engineering, Associate Professor, 工学部, 助教授 (10152175)
Project Period (FY) 1993 – 1994
KeywordsDry surface cleaning / Particle removal / Pulse air jet
Research Abstract

The present work is aimed at developing dry surface cleaning method with consecutive pulse air jet. The performance of air jet cleaning method was studied for various flat surfaces and particle materials. Major conclusion obtained by this work are ;
1.Deposition process has little effect on the removal efficiency of particles from wafer.
2.The ratio of drag force on particle to van der Waals force, F^*, is the key parameter to determine the removal efficiency of spherical particles from smooth flat surfaces.
3.Electrostatic force between charged particles and surface does not affect removal efficiency because it is negligible compared to van der Waals force.
4.Removal efficiency of spherical particle from rough surface depends on surface roughness relative to particle size.
5.Since irregularity in particle shape affects both separation distance and contact area, the effect of particle shape on removal efficiency is not trivial. However, the influence of particle shape on removal efficiency becomes more significant as particle size decreases.

  • Research Products

    (5 results)

All Other

All Publications (5 results)

  • [Publications] Otani,Y.et al.: "Removal of Fine Particles from Wafer Surface by Pulse Air Jets" KONA Power and Particle. No.12. 155-160 (1994)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Otani,Y.et al.: "Removal of Fine Particles from Smooth Flat Surfaces by Consecutive Pulse Air Jets" Aerosol Science and Technology. (発表予定). (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 大谷吉生: "月刊Semiconductor World" (株)プレスジャーナル, 5 (1993)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Otani, Y., Emi, H., Morizane, T., and Mori, J.: "Removal of Fine Particles from Wafer Surface by Pulse Air Jets" KONA Powder and Particle. No.12. 155 (1994)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Otani, Y., Namiki, N., and Emi, H.: "Removal of Fine Particles from Smooth Flat Surfaces by Consecutive Pulse Air Jets" Aerosol Science and Technology. (to be published). (1995)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1996-04-15  

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