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1996 Fiscal Year Final Research Report Summary

Development of micro optical polarization splitters having multi layr structure

Research Project

Project/Area Number 06555011
Research Category

Grant-in-Aid for Scientific Research (A)

Allocation TypeSingle-year Grants
Section試験
Research Field Applied optics/Quantum optical engineering
Research InstitutionTohoku University

Principal Investigator

KAWAKAMI Shojiro  Reseach Institute of Electrical Communication, Tohoku University Professor, 電気通信研究所, 教授 (10006223)

Co-Investigator(Kenkyū-buntansha) KATAOKA Hiroki  Sumitomo Osaka Cement, Co.Ltd., Central Research Laboratories, Research Scientis, 中央研究所, (参事)研究職
SATO Takashi  Research Institute of Electrical Communication, Tohoku University Research Assoc, 電気通信研究所, 助手 (30261572)
HANAIZUMI Osamu  Faculty of Engineer, Tohoku University Associate, Professor, 工学部, 助教授 (80183911)
Project Period (FY) 1994 – 1996
Keywordsintegrated optical device / polarization splitter / optical isolator / optical switch / multilayr / RF sputtering / plasma enhanced chemical vapor deposition
Research Abstract

A laminated polarization splitter is an ultrasmall spatial walk-off polarizer composed of periodically laminated thin films of transparent materials with a high refractive index and a low index. It is a key component to build functional optical devices for optical communication systems. In this report, we discuss the fabrication techniques of LPS's for the wavelength of 1.55 mu m and 1.3 mu m, respectively, with high performance. For the longer wavelength, we successfully deposited a-Si : H/SiOx : H multilayrs by rf sputtering method with a thickness more than 200 mu m with high optical properties and mechanical stability, and obtained low loss LPS's applicable to optical devices. For the shorter wavelength, we fabricated a-Si_<1-x>C_x/SiO_2 multilayr deposited by plasma-enhanced CVD method and obtained low loss LPS due to the study on deposition conditions such as the substrate temperature and gas flow rate. The fabricated LPS was tentatively integrated into a 2D waveguide circuit for a programable optical connect and the fundamental operation is experimentally verified. We also demonstrated lens-free and alignment-free optical isolators integrated into an array of two thermally expanded core (TEC) fibers. This verifies and endorses the Principle and usefulness of integrating functional devices into TEC fibers.

  • Research Products

    (12 results)

All Other

All Publications (12 results)

  • [Publications] Kazuo Shiraishi: "Integration of in-line optical isolators" IEEE Transaction on Magnetics. 32. 4108-4112 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y.G.Lee: "Low loss laminated polarization splitters for the wavelength lower than 1.3μm prepared by plasma enhanced chemical vapor deposition" Thin Solid Films. (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 笠原 亮一: "ファイバアレイ集積化光アイソレータの高性能化" 電子情報通信学会論文誌. 80-C-I. 136-137 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Hiroki Takahashi: "structural relaxation and stress reduction in hydrogenated silicon oxide films" Journal Applied Physics. 79. 2787 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Hiroki Takahashi: "Ar/Hz sputtering deposition of 350μm-thick Si:H/SiO_x:H multilayers having flat-interfaces for optical applications" Thin Solid Films. 277. 132 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Hiroki Takahashi: "Mechanisms of reduction of the internal stress in hydrogenated silicon oxide films prepared by Ar/Hz sputtering" Thin Solid Films. 281-282. 348 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 川上彰二郎: "光ファイバとファイバ型デバイス" 培風館, 290 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Kazuo Shiraishi: "Integration of in-line optical isolators" IEEE Transactions on Magnetics. vol.32. 4108-4112 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y.G.Lee: "Low loss laminated polarization splitters for the wavelength longer than 1.3 mu m prepared by plasma enhanced chemical vapor depostion" Thin Solid Films. (to be published).

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Hiroki Takahashi: "Structural relaxation and stress reduction in hydrogenated silicon oxide films" Journal of Applied Physics. vol.79. 2787 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Hiroki Takahashi: "Ar/H_2 sputtering deposition of 350um-thick Si : H/SiO_x : H multilayrs having flat-interfaces for optical applications" Thin solid Films. vol.277. 132 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Hiroki Takahashi: "Mechanisms of reduction of the internal stress in hydrogenated silicon oxide films prepared by Ar/H_2 sputtering" Thin Solid Films. vol.281-282. 348 (1996)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1999-03-09  

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