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1996 Fiscal Year Final Research Report Summary

Joint study on high performance resonant sensors

Research Project

Project/Area Number 07044114
Research Category

Grant-in-Aid for international Scientific Research

Allocation TypeSingle-year Grants
SectionJoint Research
Research InstitutionTOHOKU UNIVERSITY

Principal Investigator

ESASHI Masayoshi  Faculty of Engineering, Tohoku University, Professor, 工学部, 教授 (20108468)

Co-Investigator(Kenkyū-buntansha) DE Rooij N.F  ヌーシャテル大学, 微細加工研究所, 教授
SCHMIDT M.A  Dept.of Electrical Engineering and Computer Science, MIT, 電気・電子計算機学科, 助教授
SENTURIA S.D  Dept.of Electrical Engineering and Computer Science, MIT, 電気・電子計算機学科, 教授
ONO Takahito  Faculty of Engineering, Tohoku Univ., 工学部, 助手 (90282095)
HAGA Yohichi  Faculty of Engineering, Tohoku Univ., 工学部, 助手 (00282096)
KURABAYASHI Toru  Faculty of Engineering, Tohoku Univ., 工学部, 講師 (90195537)
MINAMI Kazuyuki  Faculty of Engineering, Tohoku Univ., 工学部, 講師 (00229759)
ROOIJ N.F.de  Institute of Micro technology, Univ.of Neuchatel
Project Period (FY) 1995 – 1996
KeywordsResonator / Sensor / Resonant Sensor / Electrostatic excitation / Capacitive detection / Anglar rate sensor / Electrostatic servo / Self oscillation / Frequency stabilizing
Research Abstract

In this study, the developement of novel micromachining processes and the fabrication of resonant sensors were done. Summary is as follows.
1. For making high sensitive micro resonator, the process for fabricating thin cantilever having an opposed electrode with a very narrow gap for SPM application was established. Thickness of the silicon cantilever and the gap between the cantilever and a glass substrate were less than 1mum. The novel drying method was developed for avoiding stiction by the surface tension force of liquid.
2. Vacuum packaging of micro resonator was studied for realizing high Q factor. Damping by gas molecules degrade the Q factor of the micro resonator. Vacuum packaging method using glass-silicon anodic bonding and non-evaporable getter was developed and applied to the sensor fabrication.
3. A silicon resonant angular rate sensor using electrostatic excitation and capacitive detection was developed. For this device, driving and detection circuit, self oscillation circuit, and detective resonant frequency stabilizing circuit for electrostatic servo were realized.
4. A silicon resonant angular rate sensor using electromagnetic excitation and capacitive detection was developed. Packaged sensor was work and had high Q factor. For the fabrication this sensor, a new type reactive ion etching system was developed.
5. Novel process for making thin and narrow silicon beam of resonators was developed. By this process using XeF_2 dry etching and thermal SiO_2, a silicon beam having 60mum square cross-section beam was realized.
6. Piezoelectric excitation method for large amplitude vibration was studied. Deposition method of piezoelectric thin film largely affected the piezoelectric properties. Deposition method should be investigated in future.

  • Research Products

    (18 results)

All Other

All Publications (18 results)

  • [Publications] Seongho Kong,Kazuyuki Minami,Masayoshi Esashi: "Fabrication of Reactive Ion Etching Systems for Deep Silicon Machining" 電気学会論文誌. E117. 10-14 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] J.Choi,K.Minami,M.Esashi: "Application of deep reactive ion etching for silicon angular rate sensor" Microsystem Technologies. 2. 186-190 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 長尾 勝、南 和幸、江刺正喜: "圧電薄膜を用いたシリコン角速度センサ" 電気学会研究会資料、 センサ・マイクロマシン部門総合研究会. PS-96-12. 53-62 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Masayoshi Esashi et al.: "Silicon Resonant Sensors by Micromachining" Third International Conference on Motion and Vibration Control. 194-199 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Risaku Toda,Kazuyuki Minami and Masayoshi Esashi: "Study of Xenon Difluoride Silicon Etch for Thin Beam Bulk Micromachining" Technical Digest of the 14th Sensor Symposium. 175-178 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Mitsuhiro Yamashita,Kazuyuki Minami and Masayoshi Esashi: "A Silicon Micromachined Resonant Angular Rate Sensor Using Electrostatic Excitation and Capacitive Detection" Technical Digest of the 14th Sensor Symposium. 39-42 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Ohtsu,K.Minami and M.Esashi: "Fabrication of Packaged Thin Beam Structures by an Improbed Drying Method" Proc.of the Micro Electro Mechanical Systems'96. 9. 228-233 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Honma,K.Minami and M.Esashi: "Face-Down Bonding with Sealed Cavity for Micromechanical Device Packaging" Sensors and Materials. 8. 23-31 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Ohtsu,K.Minami and M.Esashi: "Thin Cantilever Having an Opposed Electrode with a Narrow Gap for High Sensitive Sensors" 第14回「センサの基礎と応用シンポジウム」. 163-166 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Seongho Kong, Kazuyuki Minami, Masayoshi Esashi: "Fabrication of Reactive Ion Etching Systems for Deep Silicon Machining" T.IEE Japan. 117-E. 10-14 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] J.Choi, K.Minami, M.Esashi: "Application of deep reactive ion etching for silicon angular rate sensor" Microsystem Technologies. 2. 186-190 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Nagao, K.Minami and M.Esashi: "Silicon Angular Rate Sensor Using PZT Thin Film" Denkigakkai kenkyukai Shiryo (Japanese).PS-96-12. 53-62 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Masayoshi Esashi, Kazuyuki Minami, Jae-Joon Choi and Masato Ohtsu: "Silicon Resonant Sensors by Micromachining" Third International Conference on Motion and Vibration Control. 194-199 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Risaku Toda, Kazuyuki Minami and Masayoshi Esashi: "Study of Xenon Difluoride Silicon Etch for Thin Beam Bulk Micromachining" Technical Digest of the 14th Sensor Symposium. 175-178 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Mitsuhiro Yamashita, Kazuyuki Minami and Masayoshi Esashi: "A Silicon Micromachined Resonant Angular Rate Sensor Using Electrostatic Excitation and Capacitive Detection" Technical Digest of the 14th Sensor Symposium. 39-42 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Ohtsu, K.Minami and M.Esashi: "Thin Cantilever Having an Opposed Electrode with a Narrow Gap for High Sensitive Sensors" Technical Digest of the 14th Sensor Symposium. 163-166 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Masato Ohtsu, Kazuyuki Minami, Masayoshi Esashi: "FABRICATION OF PACKAGED THIN BEAM STRUCTURES BY AN IMPROVED DRYING METHOD" Proceedings, IEEE Micro Electro Mechanical Systems Workshop. 228-233 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Masato Homma, Kazuyuki Minami and Masayoshi Esashi: "Face-Down Bonding with Sealed Cavity for Micromechanical Device Packaging" Sensors and Materials. 8. 23-31 (1996)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1999-03-09  

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