1998 Fiscal Year Final Research Report Summary
A Study on Implantable Retinal Implant using Cell Culture Technique
| Project/Area Number |
08558097
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| Research Category |
Grant-in-Aid for Scientific Research (A)
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| Allocation Type | Single-year Grants |
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| Section | 展開研究 |
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| Research Field |
Biomedical engineering/Biological material science
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| Research Institution | Nagoya University |
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Principal Investigator |
UCHIKAWA Yoshiki Dept.of Computational Science and Eng., Prof., 工学研究科, 教授 (20023260)
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| Co-Investigator(Kenkyū-buntansha) |
WATANABE Masami Institute for Developmental Research, Chief Researcher, 生理学部門, 主任研究員 (10093486)
YAGI Tohru Dept.of Computational Science and Eng., Assistant Prof., 工学研究科, 助手 (90291096)
KODAMA Tetsuji Dept.of Information Electronics, Assistant Prof., 工学研究科, 助手 (50262861)
KAWASE Kazuhide Gifu University, School of Medicine, Assistant Prof., 医学部, 助手 (40234067)
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| Project Period (FY) |
1996 – 1998
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| Keywords | Retinal Implant / Neural Cell Culture / Micro-machine / Artificial Organ / Visual Information Processing |
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| Research Abstract |
A hybrid retinal implant is a visual prosthesis to reconstruct visual sensation in the blind. It will consist of an outer apparatus and an implanted MBMS (micro-electro mechanical systems). In order to connect the MEMS with the CNS (central nervous systems) , several neurons will be cultured on the top of the MEMS.Then, their axons will be guided with the peripheral nerve fiber. After the axons reach towards the CNS, they will make the proper synaptic connection with the CNS neurons. Therefore, the adequate electrical stimulation will lead the neural cells to produce the action potential so that functional connection will be realized.
The visual prosthesis "Hybrid Retinal Implant requires to facilitate a micro-electrode array for extracellular stimulation of nervous systems. This time, using micro-machine technology, we have fabricated a prototype of the array. In this array, aluminum cable leads are sandwiched with two dielectric layers ; silicon dioxyside and silicon nitride. First, a
… More
400 mum thickness silicon wafer was oxidized to a thickness of 1 mum. Conductors of aluminum were next deposited to a thickness of 0.3 mum and patterned. Then, the upper dielectric layer (i.e. silicon nitride) was deposited. Using a reactive ion etching process, silicon nitride layer was partially exposed to make electrode sites. This array consists of nine channel bipolar electrodes. Two adjacent electrodes are facing each other to make nine anode/cathode pairs in a 3x3 lattice. Each electrode has 20x20 mum square shape. The distance of each pair is up to 320 mum ; therefore, the cross-talk between each pair will be reduced. Our previous computational analysis have revealed that this specification of the micro-electrode array leads to the efficient electrical stimulation to neurons. In order to evaluate its real performance, in-vivo/in-vitro extracellular stimulation experiments will be performed in our next study.
For more information on this research, you may contact "http : //www. cmplx. cse. nagoya-u. ac. jp/research/retina/". Less
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[Publications] Yagi, T., Ito, N., Watanabe, M., Matsushima, T., Kawase, K., Uchikawa, Y.: "Computational Analysis on Extracellular Stimulation in Hybrid Retinal Implant" Abstract of 1998 ARVO,Investigative Ophthalmology & Visual Science (IOVS). Vol.39, No.4. S9991 (1998)
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「研究成果報告書概要(欧文)」より
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[Publications] Ito, N., Shirahata, A., Yagi, T., Matsushima, T., Kawase, K., Watanabe, M., Uchikawa, Y.: "Development of Artificial Retina using Cultured Neural Cells and Photoelectric Device : A Study on Electric Current with Membrane Model" Proc.of The 4th International Conf.on Neural Information Processing (ICONIP'97). 124-127 (1997)
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「研究成果報告書概要(欧文)」より
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[Publications] Yagi, T., Ito, N., Matsushima, T., Ishikawa, Y., Kawase, K., Shirahata, A., Uchikawa, Y.: "Artificial Retina using Cultured Neural Cells and Photoelectric Device" Proc.of 7th International Conf.on Human-Computer Interaction (HCI'97). 109 (1997)
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「研究成果報告書概要(欧文)」より
