2001 Fiscal Year Final Research Report Summary
The Study on the surface modification of metals by the new nitride or oxide thin films and their spectroscopic evaluation
Project/Area Number |
10555252
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Research Category |
Grant-in-Aid for Scientific Research (B)
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Allocation Type | Single-year Grants |
Section | 展開研究 |
Research Field |
Material processing/treatments
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Research Institution | Takaoka National College |
Principal Investigator |
NOSE Masateru Takaoka National College, Dept. of Industrial Arts and Crafts, Professor, 産業造形学科, 教授 (70269570)
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Co-Investigator(Kenkyū-buntansha) |
NAGAE Takekazu Toyama Industrial Research Center, Central Laboratories, 主任研究員
NAKAMURA Takio Takaoka National College, Dept. of Industrial Arts and Crafts, Professor, 産業造形学科, 教授 (60198215)
YOKOTA Masaru Takaoka National College, Dept. of Industrial Arts and Crafts, Professor, 産業造形学科, 教授 (10029225)
MAE Takehiko Toyama National College of Technology, Dept. of Environmental Material Engineering, Professor, 環境材料工学科, 教授 (10042821)
SAJI Shigeoki Toyama University, School of Engineering, Dept. of Materials and Life Science, Professor, 工学部・物質生命システム工学科, 教授 (60029072)
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Project Period (FY) |
1998 – 2001
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Keywords | reactive sputtering / Zr-N / Zr-Si-N / Zr-N-O / high hardness / golden color / decorativeness |
Research Abstract |
We have investigated the influence of nitrogen and/or oxygen content on the properties of TiN and ZrN thin films using spectrometer and colorimetric analysis as well as usual analytical instruments. The color of the films was evaluated by means of chromaticity coordinate, x and y, and the stimulus value Y. The major conclusions are as follows : (1) The color of ZrN coatings are more sensitive to nitrogen flow, namely to nitrogen partial pressure, than that of TiN coatings. (2) The bright gold-color of ZrN coatings can be obtained by the sputtering even at higher pressure of o.3 Pa. On the other hand, the bright gold color for TiN coatings is made only at the lower pressure of 0.15 Pa. (3) The oxygen content in TiN coatings increases with increasing the argon flow rate (the argon partial pressure). This tendency corresponds to the dependences of luminous reflectance and resistivity on the argon flow rate. These results can be explained from the morphology of the films and the nitrogen and oxygen concentrations. Furthermore, we have studied the influence of Si addition on the structure and the mechanical properties of ZrN thin films. A study of their structure and mechanical properties has provided as follows : (1) With increasing Si content, the hardness of the films increases initially, attaining a maximum hardness at approximately 3%, and then decreases to lower hardness than that of Zr-N binary films. (2) The hardest film containing about 3% Si consists of large crystals in the range of 20 to 25 nm. (3) The increment in hardness of ZrSiN films by silicon addition cannot be explained by the crystal size. (4) Zr-Si-N films containing 3 at% of Si have a possibility of the new decorative coatings with higher hardness and golden color.
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Research Products
(14 results)
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[Publications] M, Nose, M, Zhou, T, Nagae, T, Mae, M.Yokota, S, Saji: "Properties of Zr-Si-N Coatings Prepared by R.E-Reactive Sputering"Surface and Coatings Technology. Vol.132. 163-168 (2000)
Description
「研究成果報告書概要(欧文)」より
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[Publications] M, Nose, M, Zhou, E, Honbo, T, Mac, M.Yokota, S, Saji: "The Effect of Si Addition on the Structure and Mechanical Properties of ZrN Thin Films Deposited by r.f.- Reactive Sputtering Method"Surface and Coatings Technology. Vol.142-145. 954-958 (2001)
Description
「研究成果報告書概要(欧文)」より