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1999 Fiscal Year Final Research Report Summary

Scanning Probe Plasma Etching

Research Project

Project/Area Number 10650053
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Applied physics, general
Research InstitutionThe University of Tokyo

Principal Investigator

HOSODA Naoe  Research Center for Advanced Science and Technology, The University of Tokyo, Research Assistant, 先端科学技術研究センター, 助手 (50280954)

Co-Investigator(Kenkyū-buntansha) ITOH Toshihiro  Research Center for Advanced Science and Technology, The University of Tokyo, Associate Professor, 先端科学技術研究センター, 助教授 (80262111)
Project Period (FY) 1998 – 1999
KeywordsDynamic SFM / Plasma Etching / Micro-SFM Probe / Probe Card / Fritting
Research Abstract

1. An Au-coated conductive cantilever was used as a probe and CFィイD24ィエD2 as a reaction gas so that a probe plasma etching device was structured based on the dynamic SFM to enable local processing of sample surfaces. No etched bole was found in dynamic scanning force microscopy, although we have tried to etch the Si surface at a base vacuum of less than 1 x 10ィイD1-5ィエD1 Ton, an operation pressure of 0.1 - 1.0 mTorr after gas introduction, and a bias voltage of less than 10V.
2. For a component of the probe plasma etching system, we have developed a micro scanning force microscope (SFM) device to enable three-dimensional scanning with a probe alone as well as processing using a dynamic SFM. The device enables scanning a 1-μm area, and was provided with a vertical resolution of around 1 nm under standard operation conditions.
3. In addition, we have studied the fritting which can be utilized for making contact to integrated circuit pads in micromachined wafer probe cards, being requisite to tests of higher pad-density and smaller pad-pitch chips with high speed signal above 1 GHz. We have measured the relationship between contact forces and the fitting and have found that the fritting makes it possible to get low resistance contact to Al pads without applying external forces. When using an Au-plated probe, a low contact resistance of 0.3 Ω could be obtained. It was further revealed that a micromachined active probe card enabling the direct change of contacts, can also be realized since the resulting adhesive force was around 0.3 mN.

  • Research Products

    (12 results)

All Other

All Publications (12 results)

  • [Publications] Jiaru Chu: "Tip-scanning Dynamic Force Microscope Using Piezoelectric Cantilever for Full wafer Inspection"Japanese Journal of Applied Physics. 38・12B. 7455-7158 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Toshihiro Itoh: "Characteristics of fritting contacts utilized for micromachined wafer probe cards"Review of Scientific Instruments. 71・5. 2224-2227 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 片岡憲一: "走査型力顕微鏡のための三次元駆動圧電マイクロカンチレバー"精密工学会誌. 66・6. 965-969 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Toshihiro Itoh: "Applicability of MEMS Probe Card to Wafer-Level Test"Proceedings of InterPACK'99(Advances in Electronic Packaging 1999). 123-130 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Kenichi Kataoka: "Fritting Contacts Utilized for Micromachined Wafer Probe Card"Proc.Micro Mat 2000. (掲載予定). (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Toshihiro Itoh: "MEMS IC test probe utilizing fritting contacts"Proceedings of DTIP 2000 (Symposium on Design, Test, Integration and Packing of MEMS/MOEMS). 244-249 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Jiaru CHU et al.: "Tip-scanning Dynamic Force Microscope Using Piezoelectric Cantilever for Full Wafer Inspection"Japanese Journal of Applied Physics. 38-12B. 7455-7158 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Toshihiro ITOH et al.: "Characteristics of fritting contacts utilized for micromachined wafer probe cards"Review of Scientific Instruments. 71-5. 2224-2227 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Kenicih KATAOKA et al.: "3-Dimensional Piezodriven Microcantilever for Scanning Force Microscope"Journal of the Japan Society for precision Engineering. 66-6. 965-969 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Toshihiro ITOH et al.: "Applicability of MEMS Probe Card to Wafer-Level Test"Proceedings of InterPACK'99 (Advances in Electronic Packaging 1999). 123-130 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Kenichi KATAOKA et al.: "Fritting Contacts Utilized for Micromachined Wafer Probe Card"Proceedings of Micro Mat 2000. (in press).

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Toshihiro ITOH et al.: "MEMS IC test probe utilizing fritting contacts"Proceedings of DTIP 2000 (Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS). 244-249 (2000)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2001-10-23  

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