Research Abstract |
1.A convenient synthesis of regiocontrolled poly(2,6-dihydroxy-1,5-naphthylene) (PDHN) with high molecular weights by oxidative coupling polymerization of 2,6-dihydroxynaphthalene has been developed. A negative working and chemically amplified photosensitive polymer based on PDHN, a cross-linker, and a photoacid generator PTMA has been developed. The resist showed a sensitivity of 8.3 mJ cm^<-2> and a contrast of 11. The optically estimated dielectric constant of the resist system in 2.88. A positive working and chemically amplified photosensitive polymer based on partially (30%) Ο-methylated poly(2,6-dihydroxy-1,5-naphthylene) [PMPDHN (30)], as an acidolytic de-cross-linker, and a photoacid generator PTMA has been developed. The resist showed a sensitivity of 19.4 mJ cm^<-2> and a contrast of 7.5. The optically estimated dielectric constants (at 1 MHz) of this resist 2.9. The moisture absorption (1.7 wt% this resist system based on PMPDHN (30) and TVEB is very low compared to that (4.
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3%) of the resist system consisting of conventional PDHN resist system. 2.A chemically amplified photosensitive and thermosetting polymer based on poly[2,6-di(3-methyl-2-butenyl)phenol(15mol%)-co-2,6-dimethylphenol(85 mol%)] and a photoacid PTMA has been developed. The average refractive index of the cured copolymer film was 1.5452, from which the dielectric constant (ε) at 1 MHz was estimated as 2.6. The resist showed a sensitivity of 35 mJ cm^<-2> and a contrast of 1.6. The glass transition temperature of this polymer is 300℃ after thermal curing. Poly[(2-allyl-6-methyl-phenol(20mol%)-co-2,6-dimethylphenol(85 mol%)] after curing also showed low ε (2.6) and low dissipation factor 0.0015-0.0019 at 1 MHz. 3.A novel thermally stable and low dielectric poly(binaphthylene ether) has been developed. Polymer was easily prepared by oxidative coupling polymerization of 2,2'-bis(1-naphthyloxy)-1,1'-binaphthyl with FeCl_3 as an oxidant. The ε of polymer at 1 MHz was directly measured from the capacitance as 2.50. The modulus and hardness of polymer were determined as 9.8 GPa and 0.42 GPa. Less
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