2018 Fiscal Year Final Research Report
Development of next generation mist CVD enabling atomic level control & development of oxide quantum devices
| Project/Area Number |
15H05421
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| Research Category |
Grant-in-Aid for Young Scientists (A)
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| Allocation Type | Single-year Grants |
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| Research Field |
Crystal engineering
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| Research Institution | Kochi University of Technology |
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Principal Investigator |
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| Project Period (FY) |
2015-04-01 – 2019-03-31
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| Keywords | ミストCVD / 機能膜 / 環境負荷低減 / グリーンプロセス / 金属酸化物 / 酸化物量子デバイス / 酸化亜鉛 / 酸化ガリウム |
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| Outline of Final Research Achievements |
I have developed mist CVD, which is a thin film fabrication method using liquid droplets similar to spray pyrolysis and aerosol assisted CVD. In this budget, mist CVD had demonstrated its capability of accurately controlling thin film characteristics by the precise control of flow, which was made possible by focusing on the fact that the mist droplets were in the gas-liquid multiphase. Also, we succeeded in cathode-luminescence of Ga2O3 based materials fabricated by mist CVD, and it was a world first result.
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| Free Research Field |
機能膜作製プロセス開発
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| Academic Significance and Societal Importance of the Research Achievements |
我々の身の回りには様々な光・電子デバイスが存在する。現在それらのデバイスの多くは多岐に亘る要望に応えるため特性の高性能化が優先されており、真空などの特殊な環境が必要な機能膜作製技術や有毒物質・不安定材料などが利用され、環境への負荷が考慮されることは後回しにされがちである。本申請はデバイス作製技術の省エネ化や材料の安定性を担保しながら次世代に必要とされる量子デバイスの作製を可能とする技術の開発に焦点を当てている。
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