Spectroscopic investigation of electronic states and chemical reaction on a liquid metal surface

2017 Fiscal Year Final Research Report

• Project/Area Number: 16K13681
• Research Category: Grant-in-Aid for Challenging Exploratory Research
• Allocation Type: Multi-year Fund
• Research Field: Thin film/Surface and interfacial physical properties
• Research Institution: The University of Tokyo
• Principal Investigator: YOSHINOBU Jun 東京大学, 物性研究所, 教授 (50202403)
• Co-Investigator(Renkei-kenkyūsha): YOSHIMOTO Shinya 東京大学, 物性研究所, 助教 (90507831)
• Project Period (FY): 2016-04-01 – 2018-03-31
• Keywords: 液体金属 / 表面 / 清浄表面 / 光電子分光 / 酸化

Outline of Final Research Achievements

A sample holder was fabricated for photoelectron spectroscopy of a liquid metal surface. We selected GaIn as a liquid metal sample, because it is harmless and has low vapor pressure, First, XPS measurement of the as-installed GaIn sample was carried out. As a result, we found that the surface was covered with Ga oxide over several layers. Next, in order to clean the liquid metal surface, cooling with liquid nitrogen was carried out to solidify GaIn, and Ar ion sputtering was performed. The Ga oxide in the surface region almost disappeared and the XPS spectra indicated the liquid GaIn clean surface. Oxygen molecules were introduced at room temperature on the liquid GaIn clean surface and XPS measurement was carried out. After exposure up to 1111 L (Langmuir), we found that oxidation of Ga progresses as a function of coverage.

Free Research Field

表面科学