2011 Fiscal Year Final Research Report
Massive Parallel Electron Beam Lithography System
| Project/Area Number |
19101005
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| Research Category |
Grant-in-Aid for Scientific Research (S)
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| Allocation Type | Single-year Grants |
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| Research Field |
Microdevices/Nanodevices
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| Research Institution | Tohoku University |
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Principal Investigator |
ESASHI Masayoshi 東北大学, 原子分子材料科学高等研究機構, 教授 (20108468)
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| Co-Investigator(Kenkyū-buntansha) |
ONO Takahito 東北大学, 大学院・工学研究科, 教授 (90282095)
TANAKA Syuji 東北大学, 大学院・工学研究科, 准教授 (00312611)
TOTSU Kentaro 東北大学, マイクロシステム融合研究センター, 准教授 (60374956)
KAWAI Yusuke 東北大学, 大学院・工学研究科, 助教 (20451536)
MIYASHITA Hidetoshi 東北大学, マイクロシステム融合研究センター, 助教 (00401258)
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| Project Period (FY) |
2007 – 2011
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| Keywords | MEMS / 電子描画装置 |
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| Research Abstract |
The fabrication method for emitter with carbon nanotube at the top of the tip, optically controllable emitter, micro stage and the novel method for fabricate electro static electron rends are studied as one of the components of the massive parallel electron beam lithography system. With these components, prototype of the EB system was fabricated.
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