2022 Fiscal Year Final Research Report
Development of a new surface analysis technique using a vacuum ultraviolet short pulse laser as a probe
Project/Area Number |
19K05273
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Research Category |
Grant-in-Aid for Scientific Research (C)
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Allocation Type | Multi-year Fund |
Section | 一般 |
Review Section |
Basic Section 29020:Thin film/surface and interfacial physical properties-related
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Research Institution | University of Miyazaki |
Principal Investigator |
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Project Period (FY) |
2019-04-01 – 2023-03-31
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Keywords | レーザー脱離分析 / 真空紫外レーザー |
Outline of Final Research Achievements |
As a part of the development of a new analysis technique using an ultrashort pulse laser in the vacuum ultraviolet region, we developed an irradiation system. A near-ultraviolet laser with a wavelength of 400 nm was split into two branches, and using an optical delay, off-axis irradiation and partially overlapping of laser spots. The shapes of more than 300 irradiation marks obtained by changing the time lag were observed in detail using a scanning electron microscope. By irradiating with two beams, the dirty melted parts and large debris particles seen in the irradiation marks with a single beam are no longer seen, and shallow irradiation marks can be formed, resulting in a larger desorption volume than with single beam irradiation. decreased significantly. This result suggests the possibility of improving the analytical resolution of laser desorption analysis.
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Free Research Field |
レーザー応用工学
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Academic Significance and Societal Importance of the Research Achievements |
真空紫外短パルスレーザーをプローブとする新しい表面分析技術であるレーザー脱離質量分析は、半導体科学や各種高純度材料を扱う学術・産業分野において開発が期待されている。また、最近では、短パルスレーザーは、照射される材料によらず、およそこの世に現存する材料であれば、材料を選ばずすべての材料を脱離させることが原理的に可能なので、他にも様々な分野から注目されるようになった。たとえば、病巣などの生体組織や、放射能汚染物質などの検出にも一役買える可能性を秘めている。もちろん一朝一夕に開発が完了するものではないが、本研究成果は、そのような新技術の開発を一歩前進させたものである。
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