2010 Fiscal Year Final Research Report
Improved deposition technique of nanoparticles on substrates for the better performance of nanopaticle-based devices
| Project/Area Number |
20560715
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Reaction engineering/Process system
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| Research Institution | Tohoku University |
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Principal Investigator |
TAKAMI Seiichi 東北大学, 多元物質科学研究所, 准教授 (40311550)
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| Co-Investigator(Renkei-kenkyūsha) |
HAYAKAWA Ryoma 物質・材料研究機構, 研究員 (90469768)
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| Project Period (FY) |
2008 – 2010
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| Keywords | 金属酸化物ナノ粒子 / ナノ粒子デバイス / 有機分子表面修飾 / ボトムゲート基板 |
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| Research Abstract |
This research aims to realize the electronic devices that use metal oxide nanoparticles as semiconducting materials. The metal oxide nanoparticles, which were drop-cast on to the bottom-gate substrates, acted as a channel layer of a field-effect transistor. This research also developed a method to arrange the metal oxide nanoparticles in a well-defied manner.
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