2011 Fiscal Year Final Research Report
Development and application of Nano-ion exchange lithography
| Project/Area Number |
21360320
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Inorganic materials/Physical properties
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| Research Institution | Tokyo Institute of Technology |
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Principal Investigator |
YANO Tetsuji 東京工業大学, 大学院・理工学研究科, 准教授 (90221647)
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| Project Period (FY) |
2009 – 2011
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| Keywords | イオン交換 / ガラス / リソグラフィ |
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| Research Abstract |
Nano-ion-exchange lithography(NIEL) has been developed for the fabrication of nanometer-size structure with different refractive index in/or on the transparent glass substrate. A new glass composition suitable for NIEL has also been developed to give appropriate ionic conductivities of monovalent ions at certain elevated temperature, and multi-ion-exchanged layer has also developed ; a thin NH^+_4 containing and alkali-free layer with Ag^+ containing core layer underneath. The developed NIEL succeeded in the drawing nano-lines on glass ; thin Ag metal lines with 270nm width. This enables to develop new devices using "metamaterials".
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