Educaiton and Control of Nano-topography Mechanism in Ultrafine Fabrication

2011 Fiscal Year Final Research Report

• Project/Area Number: 21760584
• Research Category: Grant-in-Aid for Young Scientists (B)
• Allocation Type: Single-year Grants
• Research Field: Material processing/treatments
• Research Institution: Osaka University
• Principal Investigator: YAMAMOTO Hiroki 大阪大学, 産業科学研究所, 助教 (00516958)
• Project Period (FY): 2009 – 2011
• Keywords: 材料・加工処理 / リソグラフィ / 量子ビーム / ナノ材料 / 半導体超微細化

Research Abstract

Polymer structure effects on the dissolution kinetics and deprotection reaction were investigated to understand inherent extreme ultraviolet(EUV) resist characteristics. Also, the evaluation of resist profile for EUV chemically amplified resists was performed by using PROLITH and parameters obtained with EUV exposure tool. We could obtain EUV resist design for next generation lithography.

Research Products

• [Journal Article] Dissolution Kinetics in Chemically Amplified EUV Resist (2011)
  • Author(s): H. Yamamoto, T. Kozawa, S. Tagawa T. Ando, K. Ohmori, M. Sato, and J. Onodera
  • Journal Title: Journal of Photopolymer Science and Technology Volume: 24 Pages: 405-410
  • DOI: DOI:10.2494/photopolymer.24.405
  • Peer Reviewed
• [Journal Article] Characterization of EUV irradiati on effects on Polystyrene Derivatives Studied by X-ray Photoelectron Spectroscopy(XPS) and Ultraviolet Photoelectron Spectroscopy(UPS) (2011)
  • Author(s): H. Yamamoto, T. Kozawa, and S. Tagawa
  • Journal Title: Proceeding of SPIE Advances in Resist Materials and Processing Tehcnology XXVII Volume: 7972 Pages: 79721H-1-79721H-8
  • DOI: DOI:10.1117/12.879303
• [Journal Article] Negative Chemically Amplified Molecular Resist Based on Novel Fullerene Derivative for Nanolithography (2010)
  • Author(s): H. Yamamoto, T. Kozawa, S. Tagawa, T. Ando, K. Ohmori, M. Sato, and J. Onodera
  • Journal Title: Proceeding of SPIE Advances in Resist Materials and Processing Tehcnology XXVII Volume: 7639 Pages: 76390U-1-763090U-8
  • DOI: DOI:10.1117/12.846391
• [Presentation] Dissolution Kinetics and Deprotection Reaction in Chemi cally Amplified Resistsupon Exposure to Extreme Ultraviolet Radiation (2011)
  • Author(s): Hiroki Yamamoto
  • Organizer: The 12th Pacific Polymer Conference
  • Place of Presentation: Jeju・Korea
  • Year and Date: 2011-11-14
• [Presentation] Disolution Kinetics and Deprotection Reaction in Chemically Amplified EUV Resists (2011)
  • Author(s): Hiroki Yamamoto
  • Organizer: 2011 International Symposium on Extreme Ultraviolet Lithography
  • Place of Presentation: Miami Florida・USA
  • Year and Date: 2011-10-17
• [Presentation] EUV化学増幅レジストの現像解析 (2011)
  • Author(s): 山本洋揮
  • Organizer: 2011年秋季第72回応用物理学会学術講演会
  • Place of Presentation: 山形大学(山形市)
  • Year and Date: 2011-08-30
• [Presentation] EUV化学増幅レジストの現像解析 (2011)
  • Author(s): 山本洋揮
  • Organizer: International Conference of Photopolymer Sciecne and Technology
  • Place of Presentation: 千葉大学(千葉市)
  • Year and Date: 2011-06-24
• [Presentation] ナノリソグラフィ用新規フラーレン誘導体に基づいたネガ型化学増幅型分子レジスト (2010)
  • Author(s): 山本洋揮
  • Organizer: 第71回応用物理学会学術講演会
  • Place of Presentation: 長崎大学文教キャンパス(長崎市)
  • Year and Date: 2010-09-14
• [Presentation] 化学増幅型EUVレジストにおける脱保護反応 (2009)
  • Author(s): 山本洋揮
  • Organizer: 第52回放射線化学討論会
  • Place of Presentation: 福井工業大学福井大学(福井市)
  • Year and Date: 2009-09-26