2023 Fiscal Year Final Research Report
Plasma-induced bubbles for heterogeneous metal deposition and material intelligence by applying electric field gradients
| Project/Area Number |
22K18783
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| Research Category |
Grant-in-Aid for Challenging Research (Exploratory)
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| Allocation Type | Multi-year Fund |
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| Review Section |
Medium-sized Section 20:Mechanical dynamics, robotics, and related fields
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| Research Institution | Kyushu University |
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Principal Investigator |
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| Co-Investigator(Kenkyū-buntansha) |
前田 真吾 東京工業大学, 工学院, 教授 (40424808)
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| Project Period (FY) |
2022-06-30 – 2024-03-31
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| Keywords | 電界誘起気泡 / 金属析出 / 反応性界面 |
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| Outline of Final Research Achievements |
Over the two-year period 2022-2023, the conditions for deposition at the gas-liquid interface for local alloy deposition were narrowed down, and it was found that deposits were obtained according to the composition of the solution. The reason for this is that the reaction by the plasma-induced bubbles is a very fast reaction in the order of μseconds, so it is thought that the metal ions in the near vicinity are preferentially reduced, rather than those in the far distance, which have a smaller ionization tendency and faster deposition speed, suggesting that the metal ion content around the bubbles (gas-liquid interface) is dominant. This suggests that the amount of metal ions around the bubble (gas-liquid interface) is dominant. This is a characteristic that differs significantly from the conventional electrolytic plating method and is of great academic importance.
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| Free Research Field |
マイクロナノ工学, マイクロ流体工学
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| Academic Significance and Societal Importance of the Research Achievements |
本研究において局所合金析出のための気液界面の析出の条件を絞り込み，溶液の組成に応じた堆積物が得られることを明らかにした．原因としてはプラズマ誘起気泡による反応がμ秒単位の非常に高速な反応であるため，遠距離に存在するイオン化傾向の小さい金属や堆積速度の速い金属ではなく，近距離に存在する金属イオンが優先して還元されたと考えられ，気泡（気液界面）周辺の金属イオン量が支配的であると示唆される．これは従来法である電解めっき法とは大きく異なる特性で，学術的に非常に重要である．
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