2012 Fiscal Year Final Research Report
Growth of free-standing two-dimensional atomic sheet by nano-plasma processing and its applications
| Project/Area Number |
23740405
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Multi-year Fund |
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| Research Field |
Plasma science
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| Research Institution | Tohoku University |
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Principal Investigator |
KATO Toshiaki 東北大学, 大学院・工学研究科, 助教 (20502082)
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| Project Period (FY) |
2011 – 2012
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| Keywords | 単層カーボンナノウォール / 垂直配向 / グラフェン / プラズマCVD / キャリア移動度 |
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| Research Abstract |
Direct growth of graphene on an insulating substrate is realized by rapid-heating plasma CVD (RH-PCVD), which is originally developed by our group. For the first time, integration of graphene nanoribbons, quasi-one-dimensional structure of graphene, is also realized using Ni nanobar as catalysts for their growth. It is also revealed that the graphene nanoribbon devices show very high transistor performance (on/off ratio > 10,000).
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