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2013 Fiscal Year Final Research Report

Development of photonic-system-on-chip technology

Research Project

  • PDF
Project/Area Number 24651163
Research Category

Grant-in-Aid for Challenging Exploratory Research

Allocation TypeSingle-year Grants
Research Field Microdevices/Nanodevices
Research InstitutionNara Institute of Science and Technology

Principal Investigator

SASAGAWA Kiyotaka  奈良先端科学技術大学院大学, 物質創成科学研究科, 助教 (50392725)

Project Period (FY) 2012-04-01 – 2014-03-31
Keywordsマイクロセンサー / マイクロ光システム / イメージセンサー
Research Abstract

On-chip photonic devices based on wiring layers of CMOS process were designed and fabricated. The devices can be monolithically integrated, for example, on images sensors. Its structure is a metal grating on an image sensor pixel, which has characteristics of polarization separation and wavelength dependence. By using recent advanced CMOS processes, the pitches of the metal grating with wiring layers can be designed finer than visible wavelengths. In this study, the extinction ratio of approximately 100 was successfully achieved by using 65-nm process.

  • Research Products

    (12 results)

All 2014 2013 2012 Other

All Journal Article (2 results) Presentation (9 results) (of which Invited: 1 results) Remarks (1 results)

  • [Journal Article] Image sensor pixel with on-chip hig extinction ratio polarizer based on 65-nm standard CMOS technology2013

    • Author(s)
      Kiyotaka Sasagawa, Norimitsu Wakama, Toshihiko Noda, Takashi Tokuda, Kiyomi Kakiuchi, Jun Ohta
    • Journal Title

      Opt. Express

      Volume: vol.21 Pages: 11132-11140

    • DOI

      10.1364/OE.21.011132

  • [Journal Article] Polarisation analyzing complementary metal-oxide semiconductor image sensor in 65-nm standard CMOS technology2013

    • Author(s)
      Norimitsu Wakama, Daisuke Okabayashi, Toshihiko Noda, Kiyotaka Sasagawa, Takashi Tokuda, Kiyomi Kakiuchi, Jun Ohta
    • Journal Title

      J. Eng

      Pages: 1-3

    • DOI

      10.1049/joe.2013.0033

  • [Presentation] On-chip polarizer on image sensor using advanced CMOS technology2014

    • Author(s)
      Kiyotaka Sasagawa, Norimitsu Wakama, Toshihiko Noda, Takashi Tokuda, Kiyomi Kakiuchi, Jun Ohta
    • Organizer
      Photonics West
    • Place of Presentation
      San Francisco, CA, USA
    • Year and Date
      2014-02-04
    • Invited
  • [Presentation] 先端集積回路プロセスによる偏光子搭載イメージセンサ2013

    • Author(s)
      笹川清隆,若間範光,野田俊彦,徳田崇,太田淳
    • Organizer
      光応用電磁界計測(PEM)次元研究専門委員会
    • Place of Presentation
      大阪大学,大阪
    • Year and Date
      2013-08-07
  • [Presentation] A polarization-analyzing CMOS image sensor with metal wire grid in 65-nm standard CMOS technology for in-situ chiral analysis2013

    • Author(s)
      Norimitsu Wakama, Daisuke Okabayashi, Toshihiko Noda, Kiyotaka Sasagawa, Takashi Tokuda, Kiyomi Kakiuchi, Jun Ohta
    • Organizer
      Seventh International Conference on Molecular Electronics and Bioelectronics (M&BE7)
    • Place of Presentation
      Fukuoka, Japan
    • Year and Date
      2013-03-19
  • [Presentation] Dual-Layer Metal-Grid Polarizer for Polarization Image Sensor in 65-nm CMOS Technology2012

    • Author(s)
      Kiyotaka Sasagawa, Norimitsu Wakama, Daisuke Okabayashi, Toshihiko Noda, Takashi Tokuda, Jun Ohta
    • Organizer
      IEEE sensors 2012
    • Place of Presentation
      Taipei, Taiwan
    • Year and Date
      2012-10-31
  • [Presentation] Real-time multifunctional optical analyzer based on polarization-analyzing CMOS image sensor for microchemical systems2012

    • Author(s)
      Norimitsu Wakama, Nobuya Tachikawa, Kimitada Terao, Mikiko Shibata, Toshihiko Noda, Kiyotaka Sasagawa, Takashi Tokuda, Yasuhiro Nishiyama, Kiyomi Kakiuchi, Jun Ohta
    • Organizer
      2012 International Conference on Solid State Devices and Materials(SSDM2012)
    • Place of Presentation
      Kyoto, Japan
    • Year and Date
      2012-09-26
  • [Presentation] 65 nm標準CMOSプロセスを用いた偏光分析CMOSイメージセンサの消光比評価2012

    • Author(s)
      若間範充,岡林大恭,野田俊彦,笹川清隆,徳田崇,垣内喜代三,太田淳
    • Organizer
      応用物理学会学術講演会
    • Place of Presentation
      愛媛大学,松山
    • Year and Date
      2012-09-13
  • [Presentation] 65nmプロセスを用いた二層構造オンチップメタル偏光子搭載イメージセンサ2012

    • Author(s)
      岡林大恭,若間範充,野田俊彦,笹川清隆,徳田崇,太田淳
    • Organizer
      映像情報メディア学会年次大会
    • Place of Presentation
      広島市立大学,広島
    • Year and Date
      2012-08-30
  • [Presentation] 偏光分析CMOSイメージセンサによるマイクロ化学システム用in situ不斉計測デバイス2012

    • Author(s)
      若間範充,松岡均,寺尾公維,芝田実希子,立川展也,野田俊彦,笹川清隆,徳田崇,西山靖浩,垣内喜代三,太田淳
    • Organizer
      バイオ・マイクロシステム研究会
    • Place of Presentation
      京都大学,京都
    • Year and Date
      2012-06-12
  • [Presentation] On-chip metal wire grid polarizer for CMOS image sensor based on 65-nm technology2012

    • Author(s)
      Kiyotaka Sasagawa, Keisuke Ando, Hitoshi Matsuoka, Takuma Kobayashi, Toshihiko Noda, Takashi Tokuda, Jun Ohta
    • Organizer
      Conference on Lasers and Electro-Optics (CLEO 2012)
    • Place of Presentation
      San Jose, CA, USA
    • Year and Date
      2012-03-07
  • [Remarks]

    • URL

      http://mswebs.naist.jp/LABs/pdslab/index-j.html

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Published: 2015-06-25  

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