2015 Fiscal Year Final Research Report
Low-loss plasmonic metamaterials based on multiple epitaxial layers
| Project/Area Number |
25390100
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Multi-year Fund |
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| Section | 一般 |
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| Research Field |
Optical engineering, Photon science
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| Research Institution | Tohoku Institute of Technology |
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Principal Investigator |
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| Project Period (FY) |
2013-04-01 – 2016-03-31
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| Keywords | メタマテリアル / プラズモニクス / 光電子デバイス / エピタキシャル成長 |
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| Outline of Final Research Achievements |
Plasmonic metamaterials exploit surface plasmons which exist at metal-dielectric interface. Films of noble metals such as silver and gold are traditionally employed in the plasmonic devices. Metamaterials are a class of artificial materials designed to interact with light in ways no natural materials can. The response of metamaterials is very sensitive to the presence of dissipative losses in the metallic resonators. Therefore employing single crystals of noble metals can make a major contribution to the reduction of plasmonic losses. We present a simple and robust crystal growth technique, which yields large area single-crystal films of silver ideally suited for fabricating high-finesse plasmonic metamaterials. The gold/silver films were epitaxially grown on LiF substrates around 500C by using a sputtering method. We confirmed the high quality of the epitaxial thin films by measuring the surface roughness using scanning probe microscope and the optical constants using ellipsometry.
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| Free Research Field |
工学
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