High speed fabrication of large-area microcrystalline silicon films using VHF plasma with an under-expanded supersonic jet

2015 Fiscal Year Final Research Report

• Project/Area Number: 25390108
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Plasma electronics
• Research Institution: Kinki University (2015); Gifu University (2013-2014)
• Principal Investigator: MUTA Hiroshi 近畿大学, 工学部, 教授 (10219850)
• Project Period (FY): 2013-04-01 – 2016-03-31
• Keywords: VHFプラズマ / 超音速噴流 / 高速製膜 / クラスター / マルチホローカソード / シランプラズマ

Outline of Final Research Achievements

In this study, high speed fabrication of large-area microcrystalline silicon films using VHF plasma with an under-expanded supersonic jet is presented. Especially we focused on the gas flow which is the key to realize approximately 1000 times higher deposition rate than conventional one. From the detailed research of the jet flow, it was found that both the gas pressure and distance between the gas nozzle and substrate are important for the high speed deposition. Then, the great amount of clusters can be generated in the gas phase and transport into the film on the substrate, sometimes the positive charged clusters cause ion bombardment. Therefore, we proposed a new electrode system which efficiently remove the clusters and proved the validity for the film quality.

Free Research Field

応用物理学