Depth profiling of surface chemical states in nanometer region

2015 Fiscal Year Final Research Report

• Project/Area Number: 25410160
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Analytical chemistry
• Research Institution: Japan Atomic Energy Agency
• Principal Investigator: ESAKA Fumitaka 国立研究開発法人日本原子力研究開発機構, 安全研究・防災支援部門・安全研究センター, 研究主幹 (40354865)
• Co-Investigator(Kenkyū-buntansha): YAMAMOTO Hiroyuki 国立研究開発法人日本原子力研究開発機構, 原子力科学研究部門・量子ビーム応用研究センター, 研究主席 (30354822)
• Project Period (FY): 2013-04-01 – 2016-03-31
• Keywords: X線分析 / 深さ方向分析 / 光電子 / シリサイド

Outline of Final Research Achievements

X-ray photoelectron spectroscopy (XPS) using energy tunable X-rays and X-ray absorption spectroscopy (XAS) using partial electron yields were utilized for depth profiling of surface chemical states in solid samples. The analytical results of a Si(100) crystal, Au thin films on Si(100) crystals and the surface oxide layers on a magnesium silicide crystal confirmed that the combination of XPS with XAS is a powerful tool to perform non-destructive depth profiling of surface chemical states in solid samples in nanometer region.

Free Research Field

分析化学