FORMATION OF THREE-DIMENSIONAL SHAPES IN SEMICONDUCTOR SURFACES FOR FUNCTIONAL DEVICES THROUGH PHOTOCHEMICAL REACTION WITH ELECTROPHILIC FLUORINATION AGENTS

2016 Fiscal Year Final Research Report

• Project/Area Number: 26289017
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Partial Multi-year Fund
• Section: 一般
• Research Field: Production engineering/Processing studies
• Research Institution: Osaka University
• Principal Investigator: MORITA Mizuho 大阪大学, 工学(系)研究科(研究院), 教授 (50157905)
• Co-Investigator(Kenkyū-buntansha): 川合 健太郎 大阪大学, 工学(系)研究科(研究院), 助教 (90514464)
• Co-Investigator(Renkei-kenkyūsha): ADACHI Kenji 大阪大学, 大学院工学研究科, 招へい教授 (60521739)
• Project Period (FY): 2014-04-01 – 2017-03-31
• Keywords: 半導体表面 / フッ素化剤 / 三次元形状 / 光エッチング / ナノマイクロ加工

Outline of Final Research Achievements

Convex spherical shapes have been formed in silicon surfaces by photoetching with N-fluoropyridinium salts using a system with a projector and reduction optics. Silicon optical-waveguides with a vertical-bend structure have been fabricated using photoetching　with the system and the vertical transmission of light passed through a horizontal waveguide with the bend structure has been demonstrated. A multiple beam interference system has been developed and silicon surface textures with a grid-like pattern have been formed by photoetching with the three beams interference system.

Free Research Field

工学