Analysis of Notch signal pathway in epidermal regeneration and its application to therapy

2016 Fiscal Year Final Research Report

• Project/Area Number: 26461686
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Dermatology
• Research Institution: Shinshu University
• Principal Investigator: OKUYAMA Ryuhei 信州大学, 学術研究院医学系, 教授 (80292332)
• Co-Investigator(Renkei-kenkyūsha): OGAWA Eisaku 信州大学, 学術研究院医学系, 助教 (20451586) ; SAITO Rumiko 東北大学, 東北メディカルメガバンク, 非常勤講師 (40451588) ; UCHIYAMA Ryuhei 信州大学, 医学部附属病院, 助教(特定雇用) (00447757)
• Project Period (FY): 2014-04-01 – 2017-03-31
• Keywords: Notch / 再生表皮 / 皮膚潰瘍 / IL-36

Outline of Final Research Achievements

Skin ulcer is a common disease, and leads to drastic decrease in the quality of life. In order to improve the treatment of skin ulcers, we focused on Notch, a signaling molecule, because the expression of Notch decreases in regenerating epidermis around skin ulcer. Our analysis showed that Notch down-regulation suppresses keratinocyte differentiation which promotes the cellular plasticity. Furthermore, Notch down-regulation induces IL-36, a member of IL-1, suggesting the increase of the resistance to exogenous pathogenic microorganisms.

Free Research Field

皮膚科学