Study of sub-10nm alignment by fluorescence interference fringes

2015 Fiscal Year Final Research Report

• Project/Area Number: 26630016
• Research Category: Grant-in-Aid for Challenging Exploratory Research
• Allocation Type: Multi-year Fund
• Research Field: Production engineering/Processing studies
• Research Institution: Tohoku University
• Principal Investigator: NAKAGAWA Masaru 東北大学, 多元物質科学研究所, 教授 (10293052)
• Research Collaborator: ISHITO Yota ; MATSUBARA Shinya ; KIKUCHI Eri ; ITO Shunya
• Project Period (FY): 2014-04-01 – 2016-03-31
• Keywords: 生産技術 / アライメント / ナノ加工 / マイクロ・ナノデバイス / ナノインプリント / 蛍光

Outline of Final Research Achievements

The method of in-liquid optical alignment for adjusting a silica mold position to an underneath silicon substrate in ultraviolet nanoimprinting was studied by fluorescence microscopy using fluorescent UV-curable resins. In conventional reflection-mode optical microscope observation, alignment marks of concave patterns of a silica mold disappeared owing to matching refractive indexes of the resin and silica mold when the mold recesses were completely filled with the fluid resin. In contrast, the alignment marks could be visualized by fluorescence microscopy using the fluorescent resin. The fluorescence detection had the advantage of no need of any surface modification of the silica mold. Several issues were made clear during studies of course alignment with cross bars and fine alignment with interference fringes for achieving sub-10 nm alignment.

Free Research Field

生産工学・加工学