Development of Non-equilibrium Plasma CVD deposition in Ambient Air

2016 Fiscal Year Final Research Report

• Project/Area Number: 26630371
• Research Category: Grant-in-Aid for Challenging Exploratory Research
• Allocation Type: Multi-year Fund
• Research Field: Material processing/Microstructural control engineering
• Research Institution: National Institute for Materials Science
• Principal Investigator: Watanabe Makoto 国立研究開発法人物質・材料研究機構, 構造材料研究拠点, グループリーダー (00391219)
• Project Period (FY): 2014-04-01 – 2017-03-31
• Keywords: プラズマCVD / 薄膜 / 成膜プロセス

Outline of Final Research Achievements

Atmospheric pressure plasma enhanced chemical vapor deposition is an emerging large-scale and cost-effective deposition technique, which utilizes cold plasma in glow discharge state for deposition. In this work, the effects of the plasma source morphology and gas flow onto a substrate were investigated for the different plasma gases of helium and argon. Also, the laser additive manufacturing method was investigated to design and fabricate a complex shape nozzle. It has been revealed that the various processing parameters such as plasma power, distance, plasma gas flow, and precursor delivery gas flow had the significant effects on the deposition rate and quality of the deposited films.

Free Research Field

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