1987 Fiscal Year Final Research Report Summary
Development of Laser Plasma X-ray Lithography System
| Project/Area Number |
61850071
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| Research Category |
Grant-in-Aid for Developmental Scientific Research
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| Allocation Type | Single-year Grants |
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| Research Field |
電子機器工学
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| Research Institution | Institute of Laser Engineering, Osaka University |
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Principal Investigator |
NAKAI Sadao Faculty of Engineering, Osaka University, 工学部, 教授 (10029019)
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| Co-Investigator(Kenkyū-buntansha) |
FUJII Yoshimasa Sumitomo Metal Mining Co., Ltd., 光エレクトロニクスグループ, グループリーダー
柴田 淳 理学電機(株), 技師長
NAKATSUKA Masahiro Institute of Laser Engineering, Osaka University, レーザー核融合研究センター, 助教授 (20088462)
ARITOME Hiroaki Research Center for Extreme Materials, Osaka University, 極限物質センター, 助教授 (70029552)
SHIBATA Atsushi Rigaku Corporation
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| Project Period (FY) |
1986 – 1987
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| Keywords | Laser plasma / High power laser / Frequency conversion / Nonlinear optical crystal / X-ray lithography / High intensity point X-ray source / サブミクロン加工 |
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| Research Abstract |
We hav edeveloped a laser-plasma-X-ray-lithography system for sub-micron processing. The Key issues of the developments and the results are as follows:
(1) Characterization of X-ray generation by repetitive laser, laser irradiation target, dobris generation.
(2) Development of rotating target for repetitive laser shot.
(3) Vacuum sealing for soft X-ray lithography.
(4) Development of high repetitive laser with good focusability.
(5) Development of nonlinear optical crystal of low absorption ofr high repetitive operation.
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