1988 Fiscal Year Final Research Report Summary
Studies on Discoloration Ploblems of Silica Glass Used for High-Power Ultraviolet Optical Systems and on the Improvement.
| Project/Area Number |
62850141
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| Research Category |
Grant-in-Aid for Developmental Scientific Research
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| Allocation Type | Single-year Grants |
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| Research Field |
無機工業化学
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| Research Institution | Faculty of Engineering, Toyo University, |
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Principal Investigator |
IMAGAWA Hiroshi Professor, Faculty of Engineering, Toyo University,, 工学部, 教授 (80184810)
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| Co-Investigator(Kenkyū-buntansha) |
横川 清 信越化学工業精密機能材料研究所, 次長
ARAI Kazuo Chief of Material Fundamentals Section, Electrotechnical Laboratory., 室長
KAWAZOE Hiroshi Assistant Professor, Faculty of Engineering, Tokyo Inst. of Techn., 工学部, 助教授 (80087288)
HOSONO Hideo Assistant, Faculty of Engineering, Nagoya Institute of Technology, 工学部, 助手 (30157028)
ABE Yoshihiro Professor, Faculty of Engineering, Nagoya Institute of Technology, 工学部, 教授 (90024223)
YOKOKAWA Kiyoshi Deputy Head, Fine Materials Lab., Shin-Etsu Chemicals
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| Project Period (FY) |
1987 – 1988
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| Keywords | Silica glass / Excimer laser / Vacuum ultraviolet / Ultraviolet / Color center / 紫外 / 光吸収 |
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| Research Abstract |
A. Arrangement of a vacuum-ultraviolet spectrophotometer for silica glass.
In 1987 we purchased an VUV spectrophotometer (Jasco Model VUV-200) with a standard sample-chamber. Data obtained with it were compared with those obtained for the same samples using SR at ETL for reduction of measurement error. In 1988 we purchased an sample chamber of an improved type which can measure weak absorption more precisely using longer samples.
B. VUV absorption due to atomistic defects in silica glasses and its dependency on prepration histories.
We investigated quantitatively, an exponential OH tail over 7 to 8ev, a band at 7.6eV due to oxygen-deficient centers observedin glasses prepared by CVD and halogen gas dehydra-tion, and an extra tail in glasses containing oxygen-excess centers.
C. Color centers induced by excimer-laser irradiation and their suppression.
UV transmission of silica glass is severly deteriorated by an absorption band at 217nm or a band at 260nm induced by excimer-laser irradiation. We found heat-treatment in H_2 markedly supresses growth of both bands for high-OH glasses, but it enhances growth of the 217nm band for oxygen-deficient glass. We have obtained usuful knowledges of the discolora-tion problem of silica glass applied to high-power UV optics and of how to suppress it.
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